Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10100272 | Cleaning composition following CMP and methods related thereto | Roman A. Ivanov, Cheng-Yuan KO | 2018-10-16 |
| 9828574 | Cleaning composition and method for cleaning semiconductor wafers after CMP | Roman A. Ivanov, Fernando Hung, Cheng-Yuan KO | 2017-11-28 |
| 7255810 | Polishing system comprising a highly branched polymer | Kevin Moeggenborg | 2007-08-14 |
| 7044836 | Coated metal oxide particles for CMP | Bin Lu, Ethan K. Lightle, Shumin Wang | 2006-05-16 |
| 7021993 | Method of polishing a substrate with a polishing system containing conducting polymer | Jian Zhang, Shumin Wang, Isaac K. Cherian, Eric Howard Klingenberg | 2006-04-04 |
| 6811474 | Polishing composition containing conducting polymer | Isaac K. Cherian, Jian Zhang, Shumin Wang, Eric Howard Klingenberg | 2004-11-02 |