Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12234382 | CMP composition including anionic and cationic inhibitors | Hsin-Yen Wu, Jin-Hao Jhang | 2025-02-25 |
| 11629271 | Titanium dioxide containing ruthenium chemical mechanical polishing slurry | Jin-Hao Jhang | 2023-04-18 |
| 10294399 | Composition and method for polishing silicon carbide | Roman A. Ivanov, Fernando HUNG LOW, Glenn Whitener | 2019-05-21 |
| 10100272 | Cleaning composition following CMP and methods related thereto | Roman A. Ivanov, Fred Sun | 2018-10-16 |
| 9828574 | Cleaning composition and method for cleaning semiconductor wafers after CMP | Roman A. Ivanov, Fernando Hung, Fred Sun | 2017-11-28 |