Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12234382 | CMP composition including anionic and cationic inhibitors | Hsin-Yen Wu, Cheng-Yuan KO | 2025-02-25 |
| 11629271 | Titanium dioxide containing ruthenium chemical mechanical polishing slurry | Cheng-Yuan KO | 2023-04-18 |