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Silica-based slurry for selective polishing of carbon-based films |
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Selective nitride slurries with improved stability and improved polishing characteristics |
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Air pressure control system |
— |
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2016-05-17 |
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Air pressure control system |
— |
2016-04-05 |
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Wet-process ceria compositions for polishing substrates, and methods related thereto |
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2016-03-08 |
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Wet-process ceria compositions for polishing substrates, and methods related thereto |
Jeffrey Dysard, Sairam Shekhar |
2016-03-08 |
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CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
Glenn Whitener |
2016-01-19 |
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Peptide mediated synthesis of metallic and magnetic materials |
Angela M. Belcher, Chuanbin Mao, Daniel J. Solis |
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CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
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Silicon polishing compositions with high rate and low defectivity |
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Peptide mediated synthesis of metallic and magnetic materials |
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Method of manufacture of colloidal rod particles as nanobar codes |
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