| 12157834 |
Composition and method for polysilicon CMP |
Brian Reiss |
2024-12-03 |
| 11845156 |
Polishing pad employing polyamine and cyclohexanedimethanol curatives |
Rui Ma, Lin Fu, Chen-Chih Tsai, Jaeseok Lee |
2023-12-19 |
| 10920107 |
Self-stopping polishing composition and method for bulk oxide planarization |
Alexander W. Hains, Juyeon Chang, Tina Li, Viet Lam, Ji Cui +1 more |
2021-02-16 |
| 10619075 |
Self-stopping polishing composition and method for bulk oxide planarization |
Alexander W. Hains, Juyeon Chang, Tina Li, Viet Lam, Ji Cui +1 more |
2020-04-14 |
| 10619076 |
Self-stopping polishing composition and method for bulk oxide planarization |
Alexander W. Hains, Juyeon Chang, Tina Li, Viet Lam, Ji Cui +1 more |
2020-04-14 |
| 10584266 |
CMP compositions containing polymer complexes and agents for STI applications |
— |
2020-03-10 |