Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10920107 | Self-stopping polishing composition and method for bulk oxide planarization | Alexander W. Hains, Juyeon Chang, Viet Lam, Ji Cui, Sarah Brosnan +1 more | 2021-02-16 |
| 10619075 | Self-stopping polishing composition and method for bulk oxide planarization | Alexander W. Hains, Juyeon Chang, Viet Lam, Ji Cui, Sarah Brosnan +1 more | 2020-04-14 |
| 10619076 | Self-stopping polishing composition and method for bulk oxide planarization | Alexander W. Hains, Juyeon Chang, Viet Lam, Ji Cui, Sarah Brosnan +1 more | 2020-04-14 |
| 10344186 | Polishing composition comprising an amine-containing surfactant | Alexander W. Hains | 2019-07-09 |
| 10301508 | Polishing composition comprising cationic polymer additive | Viet Lam | 2019-05-28 |
| 9796882 | CMP processing composition comprising alkylamine and cyclodextrin | Alexander W. Hains | 2017-10-24 |
| 9771496 | Tungsten-processing slurry with cationic surfactant and cyclodextrin | Kevin P. Dockery, Helin Huang, Lin Fu | 2017-09-26 |
| 9567491 | Tungsten chemical-mechanical polishing composition | Lin Fu, Steven Grumbine, Jeffrey Dysard | 2017-02-14 |
| 9165489 | CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity | Kevin P. Dockery, Renhe Jia, Jeffrey Dysard | 2015-10-20 |