Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10414947 | Polishing composition containing ceria particles and method of use | Brian Reiss, Viet Lam | 2019-09-17 |
| 9850402 | CMP compositions and methods for selective removal of silicon nitride | Dmitry Dinega, Sairam Shekhar, Daniel Mateja | 2017-12-26 |
| 9828528 | Polishing composition containing ceria abrasive | Brian Reiss, Dana Sauter Van Ness, Viet Lam, Alexander W. Hains, Steven Kraft | 2017-11-28 |
| 9758697 | Polishing composition containing cationic polymer additive | Brian Reiss, Dana Sauter Van Ness, Viet Lam | 2017-09-12 |
| 9505952 | Polishing composition containing ceria abrasive | Brian Reiss, Dana Sauter Van Ness, Viet Lam, Alexander W. Hains, Steven Kraft | 2016-11-29 |
| 9434859 | Chemical-mechanical planarization of polymer films | Sudeep Pallikkara Kuttiatoor, Jeffrey Dysard | 2016-09-06 |
| 9422455 | CMP compositions exhibiting reduced dishing in STI wafer polishing | Sudeep Pallikkara Kuttiatoor, Kevin P. Dockery, Prativa PANDEY | 2016-08-23 |
| 9340706 | Mixed abrasive polishing compositions | Brian Reiss, Jakub W. Nalaskowski, Viet Lam, Jeffrey Dysard | 2016-05-17 |
| 9165489 | CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity | Tina Li, Kevin P. Dockery, Jeffrey Dysard | 2015-10-20 |
| 8906252 | CMP compositions selective for oxide and nitride with high removal rate and low defectivity | Kevin P. Dockery, Jeffrey Dysard | 2014-12-09 |
| 8864915 | Cleaning methods for improved photovoltaic module efficiency | Adam Brand, Liming Zhang, Dapeng Wang, Tzay-Fa Su, Vijay Parihar | 2014-10-21 |
| 7879255 | Method and composition for electrochemically polishing a conductive material on a substrate | Huyen Karen Tran, You Wang, Stan Tsai, Martin S. Wohlert, Daxin Mao | 2011-02-01 |
| 7582564 | Process and composition for conductive material removal by electrochemical mechanical polishing | Zhihong Wang, You Wang, Daxin Mao, Stan Tsai, Yongqi Hu +2 more | 2009-09-01 |
| 7576007 | Method for electrochemically mechanically polishing a conductive material on a substrate | You Wang, Zhihong Wang, Stan Tsai, Yongqi Hu | 2009-08-18 |
| 7504018 | Electrochemical method for Ecmp polishing pad conditioning | You Wang, Stan Tsai, Lakshmanan Karuppiah, Jie Diao, Alpay Yilmaz | 2009-03-17 |
| 7390744 | Method and composition for polishing a substrate | Feng Q. Liu, Stan Tsai, Liang-Yuh Chen | 2008-06-24 |
| 7344432 | Conductive pad with ion exchange membrane for electrochemical mechanical polishing | Liang-Yun Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +9 more | 2008-03-18 |
| 7210988 | Method and apparatus for reduced wear polishing pad conditioning | Yan Wang, Stan Tsai, Yongqi Hu, Feng Q. Liu, Liang-Yuh Chen +4 more | 2007-05-01 |