Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for electrochemically mechanically polishing a conductive material on a substrate

Method for electrochemically mechanically polishing a conductive material on a substrate

US Patent 7576007 · Granted Aug 18, 2009

Estimated economic value: $17,494,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Polishing pad with secondary window seal2025
Method and device for processing read command, controller, and storage medium2025
Data transmission method and related apparatus2025
Storage rack2025
Polishing pads for high temperature processing2024
Low-temperature metal CMP for minimizing dishing and corrosion, and improving pa2024
Window in thin polishing pad2023
Sample analyzer2023
Polishing pad with secondary window seal2023
BRAF-based polypeptides for treatment of cancer2022
High-concentration organic wastewater treatment reactor2022
Contact structures2022