| 12428580 |
CMP composition including an anionic abrasive |
Yang-Yao Lee, Hsin-Yen Wu, Na Zhang, Chi-Rung Shie |
2025-09-30 |
| 11725116 |
CMP composition including a novel abrasive |
Alexander W. Hains, Kim Marie Long, Steven Grumbine, Roman A. Ivanov, Benjamin Petro +2 more |
2023-08-15 |
| 11492514 |
Derivatized polyamino acids |
Na Zhang, David T. Bailey, Roman A. Ivanov, Deepak Shukla |
2022-11-08 |
| 11043151 |
Surface treated abrasive particles for tungsten buff applications |
Ji Cui, Helin Huang, Pankaj Kumar Singh, Hung-Tsung HUANG, Chih-Hsien Chien |
2021-06-22 |
| 10676647 |
Composition for tungsten CMP |
Na Zhang, Zhao Ting Liu, Roman A. Ivanov |
2020-06-09 |
| 10647887 |
Tungsten buff polishing compositions with improved topography |
Pankaj Kumar Singh, Steven Grumbine, Kim Marie Long |
2020-05-12 |
| 10640679 |
CMP compositions selective for oxide and nitride with improved dishing and pattern selectivity |
Sudeep Pallikkara Kuttiatoor, Charles Hamilton |
2020-05-05 |
| 10066126 |
Tungsten processing slurry with catalyst |
Helin Huang, Matthew E. Carnes, Glenn Whitener |
2018-09-04 |
| 9771496 |
Tungsten-processing slurry with cationic surfactant and cyclodextrin |
Helin Huang, Lin Fu, Tina Li |
2017-09-26 |
| 9631122 |
Tungsten-processing slurry with cationic surfactant |
Helin Huang, Lin Fu |
2017-04-25 |
| 9422455 |
CMP compositions exhibiting reduced dishing in STI wafer polishing |
Sudeep Pallikkara Kuttiatoor, Prativa PANDEY, Renhe Jia |
2016-08-23 |
| 9165489 |
CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity |
Tina Li, Renhe Jia, Jeffrey Dysard |
2015-10-20 |
| 8906252 |
CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
Renhe Jia, Jeffrey Dysard |
2014-12-09 |
| 8485654 |
Aqueous inkjet printing fluid compositions |
Allan F. Sowinski |
2013-07-16 |
| 8459787 |
Aqueous inkjet printing fluid compositions |
Allan F. Sowinski |
2013-06-11 |
| 8419176 |
Aqueous compositions with improved silicon corrosion characteristics |
Allan F. Sowinski, Barbara B. Lussier, Mihaela Madaras, Kurt D. Sieber, Hwei-Ling Yau |
2013-04-16 |
| 7368624 |
Synthesis for polycyclic aromatic hydrocarbon compounds |
Christopher T. Brown, Deepak Shukla, Jerome R. Lenhard, James Matz |
2008-05-06 |
| 7153896 |
Element for protein microarrays |
David M. Teegarden, Tiecheng Qiao, Brian J. Antalek, Susan Power |
2006-12-26 |
| 6843560 |
Ink jet printing method |
Charles E. Romano, Jr., Amanda R. Broska, Eric L. Boyle |
2005-01-18 |
| 6132944 |
Photographic element containing high dye-yield couplers |
Jared B. Mooberry, Steven M. Bonser, David Hoke, Chang-Kyu Kim, James J. Seifert +2 more |
2000-10-17 |
| 6120981 |
Photographic element containing sulfon amido compounds that boost dye formation from photographic couplers |
David Hoke, Jared B. Mooberry, Kathleen M. Yahn, David T. Southby |
2000-09-19 |
