Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silica-based slurry for selective polishing of carbon-based films

Silica-based slurry for selective polishing of carbon-based films

US Patent 11802220 · Granted Oct 31, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Composition and method for polishing boron doped polysilicon2025
Composition and method for silicon nitride CMP2025
Composition and method for polysilicon CMP2024
Method to increase barrier film removal rate in bulk tungsten slurry2023
Surface treated abrasive particles for tungsten buff applications2021
Composition and method for copper barrier CMP2021
Composition and method for metal CMP2021
Composition and method for removing residue from chemical-mechanical planarizati2019
Polishing composition containing ceria particles and method of use2019
Composition and method for polishing silicon carbide2019
Tungsten processing slurry with catalyst2018
Polishing composition containing ceria abrasive2017