Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8851059 | Self-cleaning wiresaw apparatus and method | Carlos Barros, Ramasubramanyam Nagarajan | 2014-10-07 |
| 8636560 | Wiresaw apparatus and method for continuous removal of magnetic impurties during wiresaw cutting | Ramasubramanyam Nagarajan | 2014-01-28 |
| 8623766 | Composition and method for polishing aluminum semiconductor substrates | Ji Cui, Glenn Whitener, Chih-An Lin | 2014-01-07 |
| 8597538 | Composition for improving dryness during wire sawing | Nevin Naguib Sant, Kevin Moeggenborg | 2013-12-03 |
| 8529680 | Compositions for CMP of semiconductor materials | Francesco De Rege Thesauro, Phillip W. Carter, Shoutian Li, Jian Zhang, David Schroeder +1 more | 2013-09-10 |
| 8497209 | Oxidation-stabilized CMP compositions and methods | Renjie Zhou, Zhan Chen, Phillip W. Carter | 2013-07-30 |
| 8425639 | Wire saw slurry recycling process | Gregory T. Gaudet, Nevin Naguib, Francois Batllo | 2013-04-23 |
| 8252687 | Barrier slurry for low-k dielectrics | Shoutian Li, Jeffrey Dysard, Pankaj Kumar Singh | 2012-08-28 |
| 8157876 | Slurry composition containing non-ionic polymer and method for use | Chul Woo Nam, William Ward, Ramasubramanyam Nagarajan | 2012-04-17 |
| 7994057 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Jeffrey Dysard, Sriram Anjur, Daniela White, William Ward | 2011-08-09 |
| 7803203 | Compositions and methods for CMP of semiconductor materials | Francesco De Rege Thesauro, Phillip W. Carter, Shoutian Li, Jian Zhang, David Schroeder +1 more | 2010-09-28 |
| 7776230 | CMP system utilizing halogen adduct | Francesco De Rege Thesauro | 2010-08-17 |
| 7732393 | Oxidation-stabilized CMP compositions and methods | Renjie Zhou, Zhan Chen, Phillip W. Carter | 2010-06-08 |
| 7501346 | Gallium and chromium ions for oxide rate enhancement | — | 2009-03-10 |
| 7497938 | Tribo-chronoamperometry as a tool for CMP application | Jian Zhang, Phillip W. Carter | 2009-03-03 |
| 7316603 | Compositions and methods for tantalum CMP | Phillip W. Carter, Jian Zhang, Francesco De Rege Thesauro | 2008-01-08 |
| 7311856 | Polymeric inhibitors for enhanced planarization | Renjie Zhou, Jian Zhang, Isaac K. Cherian | 2007-12-25 |
| 7093722 | Polishing composition storage container | — | 2006-08-22 |
| 7087187 | Meta oxide coated carbon black for CMP | — | 2006-08-08 |
| 7001253 | Boron-containing polishing system and method | Renjie Zhou, Issac Cherian | 2006-02-21 |
| 6867140 | Method of polishing a multi-layer substrate | Shumin Wang, Vlasta Brusic Kaufman, Isaac K. Cherian | 2005-03-15 |
| 6855266 | Polishing system with stopping compound and method of its use | Shumin Wang, Vlasta Brusic Kaufman, Isaac K. Cherian | 2005-02-15 |
| 6852632 | Method of polishing a multi-layer substrate | Shumin Wang, Vlasta Brusic Kaufman, Isaac K. Cherian, Renjie Zhou | 2005-02-08 |
| 6830503 | Catalyst/oxidizer-based CMP system for organic polymer films | — | 2004-12-14 |
| 6767476 | Polishing composition for metal CMP | Shumin Wang, Christopher C. Streinz, Eric W. G. Hoglund | 2004-07-27 |