VK

Vlasta Brusic Kaufman

CM Cabot Microelectronics: 14 patents #12 of 207Top 6%
CA Cabot: 6 patents #98 of 601Top 20%
Overall (All Time): #211,333 of 4,157,543Top 6%
21
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7381648 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Shumin Wang 2008-06-03
7354530 Chemical mechanical polishing systems and methods for their use Shumin Wang 2008-04-08
6867140 Method of polishing a multi-layer substrate Shumin Wang, Steven Grumbine, Isaac K. Cherian 2005-03-15
6855266 Polishing system with stopping compound and method of its use Shumin Wang, Steven Grumbine, Isaac K. Cherian 2005-02-15
6852632 Method of polishing a multi-layer substrate Shumin Wang, Steven Grumbine, Isaac K. Cherian, Renjie Zhou 2005-02-08
6840971 Chemical mechanical polishing systems and methods for their use Shumin Wang 2005-01-11
6620037 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Slumin Wang 2003-09-16
6593239 Chemical mechanical polishing method useful for copper substrates Rodney Kistler 2003-07-15
6569350 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Shumin Wang 2003-05-27
6432828 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Shumin Wang 2002-08-13
6362106 Chemical mechanical polishing method useful for copper substrates Rodney Kistler, Shumin Wang 2002-03-26
6316366 Method of polishing using multi-oxidizer slurry Shumin Wang 2001-11-13
6309560 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Shumin Wang 2001-10-30
6217416 Chemical mechanical polishing slurry useful for copper/tantalum substrates Rodney Kistler, Shumin Wang 2001-04-17
6126853 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler, Shumin Wang 2000-10-03
6063306 Chemical mechanical polishing slurry useful for copper/tantalum substrate Rodney Kistler, Shumin Wang 2000-05-16
6039891 Multi-oxidizer precursor for chemical mechanical polishing Shumin Wang 2000-03-21
6033596 Multi-oxidizer slurry for chemical mechanical polishing Shumin Wang 2000-03-07
5954997 Chemical mechanical polishing slurry useful for copper substrates Rodney Kistler 1999-09-21
5858813 Chemical mechanical polishing slurry for metal layers and films Debra L. Scherber, Rodney Kistler, Brian L. Mueller, Christopher C. Streinz 1999-01-12
5783489 Multi-oxidizer slurry for chemical mechanical polishing Shumin Wang 1998-07-21