Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7381648 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2008-06-03 |
| 7354530 | Chemical mechanical polishing systems and methods for their use | Shumin Wang | 2008-04-08 |
| 6867140 | Method of polishing a multi-layer substrate | Shumin Wang, Steven Grumbine, Isaac K. Cherian | 2005-03-15 |
| 6855266 | Polishing system with stopping compound and method of its use | Shumin Wang, Steven Grumbine, Isaac K. Cherian | 2005-02-15 |
| 6852632 | Method of polishing a multi-layer substrate | Shumin Wang, Steven Grumbine, Isaac K. Cherian, Renjie Zhou | 2005-02-08 |
| 6840971 | Chemical mechanical polishing systems and methods for their use | Shumin Wang | 2005-01-11 |
| 6620037 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Slumin Wang | 2003-09-16 |
| 6593239 | Chemical mechanical polishing method useful for copper substrates | Rodney Kistler | 2003-07-15 |
| 6569350 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2003-05-27 |
| 6432828 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2002-08-13 |
| 6362106 | Chemical mechanical polishing method useful for copper substrates | Rodney Kistler, Shumin Wang | 2002-03-26 |
| 6316366 | Method of polishing using multi-oxidizer slurry | Shumin Wang | 2001-11-13 |
| 6309560 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2001-10-30 |
| 6217416 | Chemical mechanical polishing slurry useful for copper/tantalum substrates | Rodney Kistler, Shumin Wang | 2001-04-17 |
| 6126853 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler, Shumin Wang | 2000-10-03 |
| 6063306 | Chemical mechanical polishing slurry useful for copper/tantalum substrate | Rodney Kistler, Shumin Wang | 2000-05-16 |
| 6039891 | Multi-oxidizer precursor for chemical mechanical polishing | Shumin Wang | 2000-03-21 |
| 6033596 | Multi-oxidizer slurry for chemical mechanical polishing | Shumin Wang | 2000-03-07 |
| 5954997 | Chemical mechanical polishing slurry useful for copper substrates | Rodney Kistler | 1999-09-21 |
| 5858813 | Chemical mechanical polishing slurry for metal layers and films | Debra L. Scherber, Rodney Kistler, Brian L. Mueller, Christopher C. Streinz | 1999-01-12 |
| 5783489 | Multi-oxidizer slurry for chemical mechanical polishing | Shumin Wang | 1998-07-21 |