| 12312702 |
Plating systems having reduced air entrainment |
Cameron Law, Daniel Durado, Richard W. Plavidal |
2025-05-27 |
|
| 11739434 |
Plating systems having reduced air entrainment |
Cameron Law, Daniel Durado |
2023-08-29 |
$78,061,000 |
| 10373864 |
Systems and methods for wetting substrates |
Paul R. McHugh, Bridger Earl HOERNER, Marvin L. Bernt, Brian Aegerter, Richard W. Plavidal +3 more |
2019-08-06 |
$24,698,000 |
| 9469913 |
Closed loop electrolyte analyzer |
Cameron Law, Justin Boucher |
2016-10-18 |
$11,711,000 |
| 7524406 |
Processing apparatus including a reactor for electrochemically etching microelectronic workpiece |
Daniel J. Woodruff, Steve Eudy, James J. Erickson, Matthew Egloff |
2009-04-28 |
$3,172,000 |
| 7294244 |
Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece |
Kyle M. Hanson |
2007-11-13 |
$1,261,000 |
| 7281741 |
End-effectors for handling microelectronic workpieces |
Daniel J. Woodruff, Randy Harris, James J. Erickson, Douglas W. Carr |
2007-10-16 |
$2,748,000 |
| 7138016 |
Semiconductor processing apparatus |
Timothy J. Reardon, Craig P. Meuchel, Aleksander Owczarz, Raymon F. Thompson |
2006-11-21 |
$4,583,000 |
| 7094291 |
Semiconductor processing apparatus |
Timothy J. Reardon, Craig P. Meuchel, Aleksander Owczarz, Raymon F. Thompson |
2006-08-22 |
$3,311,000 |
| 6869510 |
Methods and apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2005-03-22 |
$1,261,000 |
| 6773559 |
Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece |
Daniel J. Woodruff, Steve Eudy, James J. Erickson, Matthew Egloff |
2004-08-10 |
$971,000 |
| 6699373 |
Apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2004-03-02 |
$5,827,000 |
| 6645356 |
Methods and apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2003-11-11 |
$3,031,000 |
| 6547937 |
Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece |
Kyle M. Hanson |
2003-04-15 |
$1,091,000 |
| 6375741 |
Semiconductor processing spray coating apparatus |
Timothy J. Reardon, Craig P. Meuchel |
2002-04-23 |
|
| 6322119 |
Robots for microelectronic workpiece handling |
Wayne J. Schmidt |
2001-11-27 |
$1,267,000 |
| 6318951 |
Robots for microelectronic workpiece handling |
Wayne J. Schmidt |
2001-11-20 |
$1,556,000 |
| 6309520 |
Methods and apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2001-10-30 |
$2,823,000 |
| 6309524 |
Methods and apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2001-10-30 |
$2,823,000 |
| 6303010 |
Methods and apparatus for processing the surface of a microelectronic workpiece |
Daniel J. Woodruff, Kyle M. Hanson, Linlin Chen, John M. Pedersen, Vladimir Zila |
2001-10-16 |
$5,302,000 |
| 6066575 |
Semiconductor processing spray coating apparatus |
Timothy J. Reardon, Craig P. Meuchel |
2000-05-23 |
$7,940,000 |
| 5658387 |
Semiconductor processing spray coating apparatus |
Timothy J. Reardon, Craig P. Meuchel |
1997-08-19 |
$4,110,000 |
| 5584310 |
Semiconductor processing with non-jetting fluid stream discharge array |
Eric J. Bergman |
1996-12-17 |
$2,369,000 |
| 5489341 |
Semiconductor processing with non-jetting fluid stream discharge array |
Eric J. Bergman |
1996-02-06 |
$1,757,000 |
