Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Processing apparatus including a reactor for electrochemically etching microelectronic workpiece

Processing apparatus including a reactor for electrochemically etching microelectronic workpiece

US Patent 7524406 · Granted Apr 28, 2009

Estimated economic value: $3,172,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plating systems having reduced air entrainment2025
Method and apparatus for post exposure processing of photoresist wafers2024
Plating systems having reduced air entrainment2023
Method and apparatus for post exposure processing of photoresist wafers2021
Microelectronic substrate electro processing system2020
Safety syringe and needle shield2020
Electroplating dynamic edge control2019
Method and apparatus for post exposure processing of photoresist wafers2019
Systems and methods for wetting substrates2019
Electroplating tool with feedback of metal thickness distribution and correction2019
Container for sharp medical waste2019
Method and apparatus for post exposure processing of photoresist wafers2019