Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for post exposure processing of photoresist wafers

Method and apparatus for post exposure processing of photoresist wafers

US Patent 10474033 · Granted Nov 12, 2019

Estimated economic value: $41,829,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Total or local thickness variation for optical devices2025
Airgap structures for improved eyepiece efficiency2025
Table lamp2025
Method for forming integrated circuit structures2025
Large data read techniques2025
Directional selective fill for silicon gap fill processes2025
Table lamp2025
Atomic layer deposition on optical structures2025
Methods for high-resolution, stable measurement of pitch and orientation in opti2025
Plasma source with floating electrodes2025
Methods, systems, and apparatus for inkjet printing self-assembled monoloayer (S2025
Ion implantation to modify glass locally for optical devices2025