MR

Mike Ravkin

Lam Research: 50 patents #30 of 2,128Top 2%
📍 Sunnyvale, CA: #342 of 14,302 inventorsTop 3%
🗺 California: #7,932 of 386,348 inventorsTop 3%
Overall (All Time): #54,595 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 26–50 of 50 patents

Patent #TitleCo-InventorsDate
7416370 Method and apparatus for transporting a substrate using non-Newtonian fluid John M. de Larios, John Parks, Mikhail Korolik, Fred C. Redeker 2008-08-26
7387689 Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces John M. de Larios, Carl Woods, Fritz Redeker, James P. Garcia 2008-06-17
7350315 Edge wheel dry manifold Glenn W. Davis, Carl Woods, John Parks, Fred C. Redeker, Michael L. Orbock 2008-04-01
7264007 Method and apparatus for cleaning a substrate using megasonic power John M. Boyd, Fred C. Redeker, John M. de Larios 2007-09-04
7234477 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces John M. de Larios, Carl Woods, Fritz Redeker, James P. Garcia, Afshin Nickhou 2007-06-26
7153400 Apparatus and method for depositing and planarizing thin films of semiconductor wafers John M. Boyd, Yezdi Dordi, Fred C. Redeker, John M. de Larios 2006-12-26
7069937 Vertical proximity processor James P. Garcia, Carl Woods, Fred C. Redeker, John M. de Larios 2006-07-04
7029369 End-point detection apparatus Katrina Mikhaylich, Yehiel Gotkis 2006-04-18
6858091 Method for controlling galvanic corrosion effects on a single-wafer cleaning system John M. Boyd, Katrina Mikhaylich 2005-02-22
6827793 Drip manifold for uniform chemical delivery Don E. Anderson, Katrina Mikhaylich, John M. de Larios 2004-12-07
6726530 End-point detection system for chemical mechanical polishing applications Katrina Mikhaylich, Yehiel Gotkis 2004-04-27
6711775 System for cleaning a semiconductor wafer Katrina Mikhaylich, Don E. Anderson 2004-03-30
6679763 Apparatus and method for qualifying a chemical mechanical planarization process John M. Boyd, Katrina Mikhaylich 2004-01-20
6622335 Drip manifold for uniform chemical delivery Don E. Anderson, Katrina Mikhaylich, John M. de Larios 2003-09-23
6616772 Methods for wafer proximity cleaning and drying John M. de Larios, Glen Travis, Jim Keller, Wilbur C. Krusell 2003-09-09
6611326 System and apparatus for evaluating the effectiveness of wafer drying operations Vladislav V. Yakovlev, Katrina Mikhaylichenko, John M. de Larios 2003-08-26
6594847 Single wafer residue, thin film removal and clean Wilbur C. Krusell, John M. de Larios 2003-07-22
6543084 Wafer scrubbing brush core Tanlin Dickey, Julia Svirchevski, Donald Anderson, Helmuth Treichel, Roy Winston Pascal +1 more 2003-04-08
6537381 Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing Katrina Mikhaylich 2003-03-25
6521050 Methods for evaluating advanced wafer drying techniques Katrina Mikhaylichenko, Vladislav V. Yakovlev, John M. de Larios 2003-02-18
6488040 Capillary proximity heads for single wafer cleaning and drying John M. de Larios, Glen Travis, Jim Keller, Wilbur C. Krusell 2002-12-03
6435952 Apparatus and method for qualifying a chemical mechanical planarization process John M. Boyd, Katrina Mikhaylich 2002-08-20
6375540 End-point detection system for chemical mechanical posing applications Katrina Mikhaylich, Yehiel Gotkis 2002-04-23
6361414 Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process Katrina Mikhaylich, Don E. Anderson 2002-03-26
6240588 Wafer scrubbing brush core Tanlin Dickey, Julia Svirchevski, Donald Anderson, Helmuth Treichel, Roy Winston Pascal +1 more 2001-06-05