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Single wafer apparatus for drying semiconductor substrates using an inert gas air-knife |
Nathan D. Stein, Younes Achkire, Timothy Joseph Franklin, Dan Marohl |
2012-12-04 |
| 7686935 |
Pad-assisted electropolishing |
Steven T. Mayer, John Drewery |
2010-03-30 |
| 7364349 |
Chemical dilution system for semiconductor device processing system |
Younes Achkire, Jonathan Frankel, Kien-Bang Lam |
2008-04-29 |
| 7270597 |
Method and system for chemical mechanical polishing pad cleaning |
Katrina Mikhaylich |
2007-09-18 |
| 7063455 |
Chemical dilution system for semiconductor device processing system |
Younces Achkire, Jonathan Frankel, Kien-Bang Lam |
2006-06-20 |
| 6994611 |
Method and system for cleaning a chemical mechanical polishing pad |
Katrina Mikhaylich |
2006-02-07 |
| 6543084 |
Wafer scrubbing brush core |
Tanlin Dickey, Donald Anderson, Mike Ravkin, Helmuth Treichel, Roy Winston Pascal +1 more |
2003-04-08 |
| 6405399 |
Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing |
Jeffrey Farber |
2002-06-18 |
| 6352595 |
Method and system for cleaning a chemical mechanical polishing pad |
Katrina Mikhaylich |
2002-03-05 |
| 6240588 |
Wafer scrubbing brush core |
Tanlin Dickey, Donald Anderson, Mike Ravkin, Helmuth Treichel, Roy Winston Pascal +1 more |
2001-06-05 |
| 6170110 |
Apparatus for HF-HF cleaning |
Katrina Mikhaylich, Jackie Zhang |
2001-01-09 |
| 6093254 |
Method of HF-HF Cleaning |
Katrina Mikhaylich, Jackie Zhang |
2000-07-25 |
