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Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus |
G. Grant Peng, Cristian Paduraru |
2012-10-16 |
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Methods of and apparatus for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus |
G. Grant Peng, Cristian Paduraru |
2011-11-08 |
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Method and system for chemical mechanical polishing pad cleaning |
Julia Svirchevski |
2007-09-18 |
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Method and apparatus for simultaneously cleaning the front side and back side of a wafer |
John M. Boyd, Fred C. Redeker |
2007-06-19 |
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End-point detection apparatus |
Mike Ravkin, Yehiel Gotkis |
2006-04-18 |
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Method and system for cleaning a chemical mechanical polishing pad |
Julia Svirchevski |
2006-02-07 |
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Method for controlling galvanic corrosion effects on a single-wafer cleaning system |
John M. Boyd, Mike Ravkin |
2005-02-22 |
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In-situ local heating using megasonic transducer resonator |
John M. Boyd |
2005-01-25 |
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Drip manifold for uniform chemical delivery |
Don E. Anderson, Mike Ravkin, John M. de Larios |
2004-12-07 |
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Web-style pad conditioning system and methods for implementing the same |
John M. Boyd |
2004-10-05 |
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End-point detection system for chemical mechanical polishing applications |
Mike Ravkin, Yehiel Gotkis |
2004-04-27 |
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System for cleaning a semiconductor wafer |
Mike Ravkin, Don E. Anderson |
2004-03-30 |
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Apparatus and method for qualifying a chemical mechanical planarization process |
John M. Boyd, Mike Ravkin |
2004-01-20 |
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Drip manifold for uniform chemical delivery |
Don E. Anderson, Mike Ravkin, John M. de Larios |
2003-09-23 |
| 6616516 |
Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates |
Michael Ravkin, John M. de Larios |
2003-09-09 |
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Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing |
Mike Ravkin |
2003-03-25 |
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Sacrificial retaining ring CMP system and methods for implementing the same |
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2002-10-29 |
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Apparatus and method for qualifying a chemical mechanical planarization process |
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2002-08-20 |
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System and method of defect optimization for chemical mechanical planarization of polysilicon |
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2002-08-13 |
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End-point detection system for chemical mechanical posing applications |
Mike Ravkin, Yehiel Gotkis |
2002-04-23 |
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Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process |
Mike Ravkin, Don E. Anderson |
2002-03-26 |
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Method and system for cleaning a chemical mechanical polishing pad |
Julia Svirchevski |
2002-03-05 |
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Apparatus for HF-HF cleaning |
Julia Svirchevski, Jackie Zhang |
2001-01-09 |
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Method of HF-HF Cleaning |
Julia Svirchevski, Jackie Zhang |
2000-07-25 |
