HT

Helmuth Treichel

SA Siemens Aktiengesellschaft: 6 patents #2,149 of 22,248Top 10%
Lam Research: 5 patents #568 of 2,128Top 30%
DI Dielectric Coating Industries: 1 patents #3 of 3Top 100%
NS Novellus Systems: 1 patents #479 of 780Top 65%
Overall (All Time): #379,750 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10329447 Polymer based roll coating 2019-06-25
6875091 Method and apparatus for conditioning a polishing pad with sonic energy Allan M. Radman, Alan J. Jensen, Robert G. Boehm, Jr., Michael S. Lacy, Eric A. Dunton 2005-04-05
6693043 Method for removing photoresist from low-k films in a downstream plasma system Senzi Li, Kirk Ostrowski, Chevan Goonetilleke, Jim Su, David Chen 2004-02-17
6543084 Wafer scrubbing brush core Tanlin Dickey, Julia Svirchevski, Donald Anderson, Mike Ravkin, Roy Winston Pascal +1 more 2003-04-08
6261407 Method and apparatus for removal of thin films from wafers Michael Ravkin, Don E. Anderson, John M. de Larios 2001-07-17
6240588 Wafer scrubbing brush core Tanlin Dickey, Julia Svirchevski, Donald Anderson, Mike Ravkin, Roy Winston Pascal +1 more 2001-06-05
6187684 Methods for cleaning substrate surfaces after etch operations Jeffrey Farber, Allan M. Radman 2001-02-13
6057229 Method for metallizing submicron contact holes in semiconductor bodies Konrad Hieber, Heinrich Koerner 2000-05-02
5629053 Method for manufacturing microcrystalline cubic boron-nitride-layers Oswald Spindler, Rainer Braun, Bernhard Neureither, Thomas Kruck 1997-05-13
5478780 Method and apparatus for producing conductive layers or structures for VLSI circuits Heinrich Koerner, Konrad Hieber, Peter Kuecher 1995-12-26
5399389 Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates Konrad Hieber, Jasper Von Tomkewitsch, Oswald Spindler, Zvonimir Gabric, Alexander Gschwandtner 1995-03-21
4990365 Method for producing silicon boronitride layers Oswald Spindler, Bernhard Neureither 1991-02-05
4755486 Method of producing a defined arsenic doping in silicon semiconductor substrates Frank Becker 1988-07-05