Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6057229 | Method for metallizing submicron contact holes in semiconductor bodies | Helmuth Treichel, Heinrich Koerner | 2000-05-02 |
| 5526122 | Method for determining the mass flow of gases on the basis of optical absorption and employment of said method | Andreas Intemann, Heinrich Körner | 1996-06-11 |
| 5478780 | Method and apparatus for producing conductive layers or structures for VLSI circuits | Heinrich Koerner, Helmuth Treichel, Peter Kuecher | 1995-12-26 |
| 5399389 | Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates | Jasper Von Tomkewitsch, Oswald Spindler, Helmuth Treichel, Zvonimir Gabric, Alexander Gschwandtner | 1995-03-21 |
| 4810335 | Method for monitoring etching processes | — | 1989-03-07 |
| 4767496 | Method for controlling and supervising etching processes | — | 1988-08-30 |
| 4740479 | Method for the manufacture of cross-couplings between n-channel and p-channel CMOS field effect transistors of static write-read memories | Franz Neppl, Ulrich Schwabe | 1988-04-26 |
| 4680612 | Integrated semiconductor circuit including a tantalum silicide diffusion barrier | Franz Neppl, Konrad Schober | 1987-07-14 |
| 4673968 | Integrated MOS transistors having a gate metallization composed of tantalum or niobium or their silicides | Franz Neppl | 1987-06-16 |
| 4640844 | Method for the manufacture of gate electrodes formed of double layers of metal silicides having a high melting point and doped polycrystalline silicon | Franz Neppl, Ulrich Schwabe | 1987-02-03 |
| 4608271 | Method for the manufacture of metal silicide layers by means of reduced pressure gas phase deposition | Manfred Stolz, Claudia Wieczorek | 1986-08-26 |
| 4592921 | Method for monitoring and regulating the composition and the layer thickness of metallically conductive alloy layers during their manufacture | Norbert Mayer | 1986-06-03 |
| 4562089 | Method of measuring electric resistance of thin metallic layers manufactured under the influence of a plasma | Norbert Mayer | 1985-12-31 |
| 4543576 | System for measuring electrical resistance and temperature during manufacture of thin, conductive films deposited on substrates by means of evaporation or sputter deposition | Norbert Mayer | 1985-09-24 |
| 4510670 | Method for the manufacture of integrated MOS-field effect transistor circuits silicon gate technology having diffusion zones coated with silicide as low-impedance printed conductors | Ulrich Schwabe, Franz Neppl | 1985-04-16 |
| 4501769 | Method for selective deposition of layer structures consisting of silicides of HMP metals on silicon substrates and products so-formed | Claudia Wieczorek | 1985-02-26 |
| 4414274 | Thin film electrical resistors and process of producing the same | — | 1983-11-08 |
| 4351695 | Method of producing low-resistant, monocrystalline metallic layers by implanting ions into a polycrystalline metal layer and heating to produce a monocrystalline layer | Norbert Mayer | 1982-09-28 |
| 4331702 | Method for reproducible manufacture of metallic layers | Norbert Mayer | 1982-05-25 |
| 4294871 | Method for depositing a layer on the inside of cavities of a work piece | Manfred Stolz | 1981-10-13 |
| 4258658 | CVD Coating device for small parts | Alfred Politycki, Manfred Stolz | 1981-03-31 |