OS

Oswald Spindler

SA Siemens Aktiengesellschaft: 7 patents #1,726 of 22,248Top 8%
Infineon Technologies Ag: 5 patents #2,452 of 7,486Top 35%
📍 Vaterstetten, DE: #13 of 126 inventorsTop 15%
Overall (All Time): #427,077 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6815224 Low-temperature processing of a ferroelectric strontium bismuth tantalate layer, and fabrication of ferroelectric components using the layer Harald Bachhofer, Thomas Haneder, Rainer Waser 2004-11-09
6429092 Collar formation by selective oxide deposition Jochen Beintner, Alexander Michaelis, Ulrike Gruening, Zvonimir Gabric 2002-08-06
6380074 Deposition of various base layers for selective layer growth in semiconductor production Markus Kirchhoff, Hans-Peter Sperlich, Uwe Schilling, Zvonimir Gabric, Stephan Wege +1 more 2002-04-30
6184091 Formation of controlled trench top isolation layers for vertical transistors Ulrike Gruening, Jochen Beintner, Dirk Tobben, Gill Yong Lee, Zvonimir Gabric 2001-02-06
6177698 Formation of controlled trench top isolation layers for vertical transistors Ulrike Gruening, Jochen Beintner, Dirk Tobben, Gill Yong Lee, Zvonimir Gabric 2001-01-23
5965203 Method for depositing a silicon oxide layer Zvonimir Gabric 1999-10-12
5837611 Production method for an insulation layer functioning as an intermetal dielectric Zvonimir Gabric, Thomas Grassl 1998-11-17
5780103 Method for forming of a silicon oxide layer on a topography Dirk Toebben, Doerthe Groteloh, Michael Rogalli 1998-07-14
5629053 Method for manufacturing microcrystalline cubic boron-nitride-layers Helmuth Treichel, Rainer Braun, Bernhard Neureither, Thomas Kruck 1997-05-13
5399389 Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates Konrad Hieber, Jasper Von Tomkewitsch, Helmuth Treichel, Zvonimir Gabric, Alexander Gschwandtner 1995-03-21
5281302 Method for cleaning reaction chambers by plasma etching Zvonimir Gabric, Alexander Gschwandtner 1994-01-25
4990365 Method for producing silicon boronitride layers Helmuth Treichel, Bernhard Neureither 1991-02-05