Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9252011 | Method for forming a layer on a substrate at low temperatures | Juergen Niess, Wilfried Lerch, Wilhelm Kegel | 2016-02-02 |
| 7665416 | Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles | Josef Mathuni, Alexander Mattheus, Stephan Schneider, Jürgen Sellmaier, Heinz Steinhardt | 2010-02-23 |
| 6706141 | Device to generate excited/ionized particles in a plasma | Heinz Steinhardt, Josef Mathuni | 2004-03-16 |
| 6566271 | Method of producing a semiconductor surface covered with fluorine | Gudrun Innertsberger, Andreas Grassl, Barbara Fröschle, Martin Kerber, Alexander Mattheus | 2003-05-20 |
| 6559005 | Method for fabricating capacitor electrodes | Martin Gutsche | 2003-05-06 |
| 6232196 | Method of depositing silicon with high step coverage | Ivo Raaijmakers, Christopher François Lilian Pomarede, Cornelius Alexander van der Jengd, Andreas Grassl | 2001-05-15 |
| 5874366 | Method for etching a semiconductor substrate and etching system | Roland Sporer, Josef Mathuni | 1999-02-23 |
| 5727017 | Method and apparatus for determining emissivity of semiconductor material | Michael Maurer, Wilfried Lerch | 1998-03-10 |
| 5399389 | Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates | Konrad Hieber, Jasper Von Tomkewitsch, Oswald Spindler, Helmuth Treichel, Zvonimir Gabric | 1995-03-21 |
| 5281302 | Method for cleaning reaction chambers by plasma etching | Zvonimir Gabric, Oswald Spindler | 1994-01-25 |