Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10867825 | Wafer boat and treatment apparatus for wafers | Michael Klick, Ralf Rothe, Johannes Rehli | 2020-12-15 |
| 9805993 | Device for determining the temperature of a substrate | Hartmut Rick, Jürgen Niess | 2017-10-31 |
| 9711388 | Substrate holder and a device and a method for treating substrates | Johann Georg Reichart, Wilhelm Kegel, Günther Kummer, Reinhold Obst | 2017-07-18 |
| 9612158 | Device for determining the temperature of a substrate | Denise Reichel, Jeff Gelpey, Wolfgang Skorupa, Thomas Schumann | 2017-04-04 |
| 9252011 | Method for forming a layer on a substrate at low temperatures | Juergen Niess, Wilhelm Kegel, Alexander Gschwandtner | 2016-02-02 |
| 8716153 | Device and method for producing dielectric layers in microwave plasma | Zsolt Nenyel, Thomas Theiler | 2014-05-06 |
| 8236706 | Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures | Bruce W. Peuse, Yaozhi Hu, Paul Janis Timans, Guangcai Xing, Sing-Pin Tay +4 more | 2012-08-07 |
| 7977258 | Method and system for thermally processing a plurality of wafer-shaped objects | Zsolt Nenyei, Paul Janis Timans, Juergen Niess, Manfred Falter, Patrick Schmid +6 more | 2011-07-12 |
| 6953338 | Device for thermal treatment of substrates | Uwe Kreiser, Karsten Weber, Michael Grandy, Patrick Schmid, Jürgen Niess +1 more | 2005-10-11 |
| 6830631 | Method for the removing of adsorbed molecules from a chamber | Zsolt Nenyei, Jürgen Niess, Thomas Graf | 2004-12-14 |
| 6809011 | Adjusting of defect profiles in crystal or crystalline-like structures | Jürgen Niess | 2004-10-26 |
| 6561694 | Method and device for calibrating measurements of temperatures independent of emissivity | Markus Hauf | 2003-05-13 |
| 6100149 | Method for rapid thermal processing (RTP) of silicon substrates | Zsolt Nenyei, Helmut Sommer | 2000-08-08 |
| 5935650 | Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) system | Georg Roters, Peter Muenzinger, Roland Mader | 1999-08-10 |
| 5727017 | Method and apparatus for determining emissivity of semiconductor material | Michael Maurer, Alexander Gschwandtner | 1998-03-10 |