GR

Georg Roters

MG Mattson Thermal Products Gmbh: 3 patents #2 of 26Top 8%
MT Mattson Technology: 2 patents #87 of 230Top 40%
Infineon Technologies Ag: 1 patents #4,439 of 7,486Top 60%
Overall (All Time): #746,702 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8236706 Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures Bruce W. Peuse, Yaozhi Hu, Paul Janis Timans, Guangcai Xing, Wilfried Lerch +4 more 2012-08-07
7151060 Device and method for thermally treating semiconductor wafers Steffen Frigge, Sing-Pin Tay, Yao Zhi Hu, Regina Hayn, Jens-Uwe Sachse +2 more 2006-12-19
7144747 Method for thermally treating a substrate that comprises several layers Hin Yiu Anthony Chung 2006-12-05
7144826 Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment Roland Mader, Helmut Sommer, Genrih Erlikh, Yehuda Pashut 2006-12-05
7101812 Method of forming and/or modifying a dielectric film on a semiconductor surface Ignaz Eisele, Alexandra Ludsteck, Jörg Schulze, Zsolt Nenyei, Waltraud Dietl 2006-09-05
7094637 Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates Olaf Storbeck, Wilhelm Kegel, Jens-Uwe Sachse, Michael Stadtmüller, Regina Hayn +2 more 2006-08-22
5935650 Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) system Wilfried Lerch, Peter Muenzinger, Roland Mader 1999-08-10