| 10954120 |
Micromechanical sensor that includes a stress decoupling structure |
Christoph Schelling |
2021-03-23 |
|
| 10766778 |
Polycrystalline material having low mechanical strain; method for producing a polycrystalline material |
Andreas Hartlieb, Heiko Stahl, Juergen Butz |
2020-09-08 |
|
| 9816920 |
Method for producing an integrated micromechanical fluid sensor component, integrated micromechanical fluid sensor component and method for detecting a fluid by means of an integrated micromechanical fluid sensor component |
Richard Fix, Rene Hartke |
2017-11-14 |
|
| 9632123 |
Micromechanical electric field meter as a thunderstorm warning device |
Lutz Mueller |
2017-04-25 |
|
| 8963294 |
Dense chevron finFET and method of manufacturing same |
Thomas Ludwig, Edward J. Nowak |
2015-02-24 |
$3,851,000 |
| 8614485 |
Process for fabrication of FINFETs |
Gary B. Bronner, Ramachandra Divakaruni, Yujun Li |
2013-12-24 |
$7,453,000 |
| 7785944 |
Method of making double-gated self-aligned finFET having gates of different lengths |
Huilong Zhu, Bruce B. Doris, Xinlin Wang, Ying Zhang, Philip J. Oldiges |
2010-08-31 |
$3,369,000 |
| 7767562 |
Method of implanting using a shadow effect |
Helmut Tews |
2010-08-03 |
|
| 7737502 |
Raised STI process for multiple gate ox and sidewall protection on strained Si/SGOI sructure with elevated source/drain |
Gary B. Bronner, Ramachandra Divakaruni, Byeong Y. Kim |
2010-06-15 |
$4,416,000 |
| 7696539 |
Device fabrication by anisotropic wet etch |
Yujun Li, Kenneth T. Settlemyer, Jr. |
2010-04-13 |
$5,309,000 |
| 7683428 |
Vertical Fin-FET MOS devices |
Dureseti Chidambarrao, Ramachandra Divakaruni |
2010-03-23 |
$4,775,000 |
| 7666741 |
Corner clipping for field effect devices |
Yujun Li, Kenneth T. Settlemyer, Jr. |
2010-02-23 |
$6,192,000 |
| 7470570 |
Process for fabrication of FinFETs |
Gary B. Bronner, Ramachandra Divakaruni, Yujun Li |
2008-12-30 |
$5,097,000 |
| 7410844 |
Device fabrication by anisotropic wet etch |
Yujun Li, Kenneth T. Settlemyer, Jr. |
2008-08-12 |
$8,244,000 |
| 7348641 |
Structure and method of making double-gated self-aligned finFET having gates of different lengths |
Huilong Zhu, Bruce B. Doris, Xinlin Wang, Ying Zhang, Philip J. Oldiges |
2008-03-25 |
$5,860,000 |
| 7346887 |
Method for fabricating integrated circuit features |
Lars Liebmann |
2008-03-18 |
$8,037,000 |
| 7323374 |
Dense chevron finFET and method of manufacturing same |
Thomas Ludwig, Edward J. Nowak |
2008-01-29 |
$11,919,000 |
| 7157329 |
Trench capacitor with buried strap |
Helmut Tews, Stephan Kudelka |
2007-01-02 |
|
| 7129564 |
Structure and method of forming a notched gate field effect transistor |
Yujun Li, Naim Moumen, Porshia Wrschka |
2006-10-31 |
$4,068,000 |
| 7101755 |
Gate conductor isolation and method for manufacturing same |
— |
2006-09-05 |
$265,000 |
| 7091103 |
TEOS assisted oxide CMP process |
Laertis Economikos, Michael Wise, Andreas Knorr |
2006-08-15 |
|
| 7091566 |
Dual gate FinFet |
Huilong Zhu, Bruce B. Doris, Ying Zhang |
2006-08-15 |
$3,598,000 |
| 7087952 |
Dual function FinFET, finmemory and method of manufacture |
Huilong Zhu, Bruce B. Doris |
2006-08-08 |
$2,377,000 |
| 7087532 |
Formation of controlled sublithographic structures |
David M. Dobuzinsky, Siddhartha Panda |
2006-08-08 |
$2,377,000 |
| 7087471 |
Locally thinned fins |
— |
2006-08-08 |
$2,377,000 |
