Issued Patents All Time
Showing 26–50 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8591662 | Methods for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2013-11-26 |
| 8555903 | Method and apparatus for removing contamination from substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker +2 more | 2013-10-15 |
| 8535451 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Fritz Redeker, Aleksander Owczarz | 2013-09-17 |
| 8522801 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2013-09-03 |
| 8522799 | Apparatus and system for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker +2 more | 2013-09-03 |
| 8480810 | Method and apparatus for particle removal | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fritz Redeker | 2013-07-09 |
| 8475599 | Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions | Erik M. Freer, John M. de Larios, Michael Ravkin, Katrina Mikhaylichenko, Fritz Redeker | 2013-07-02 |
| 8388762 | Substrate cleaning technique employing multi-phase solution | Erik M. Freer, John deLarios, Michael Ravkin, Fritz Redeker | 2013-03-05 |
| 8323420 | Method for removing material from semiconductor wafer and apparatus for performing the same | Michael Ravkin, John deLarios, Fritz Redeker, John M. Boyd | 2012-12-04 |
| 8316866 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2012-11-27 |
| 8287647 | Apparatus and method for atomic layer deposition | Hyungsuk Alexander Yoon, Fritz Redeker, John M. Boyd, Yezdi Dordi | 2012-10-16 |
| 8242067 | Two-phase substrate cleaning material | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker | 2012-08-14 |
| 8236382 | Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same | Michael Ravkin, John M. de Larios, Michael G. R. Smith, Carl Woods | 2012-08-07 |
| 8137474 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2012-03-20 |
| 8128278 | Methods and apparatus for thin metal film thickness measurement | Yehiel Gotkis | 2012-03-06 |
| 8043441 | Method and apparatus for cleaning a substrate using non-Newtonian fluids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Fred C. Redeker | 2011-10-25 |
| 8011116 | Substrate proximity drying using in-situ local heating of substrate | Katrina Mikhaylichenko, Kenneth C. Dodge, Michael Ravkin, John M. de Larios, Fritz Redeker | 2011-09-06 |
| 7975708 | Proximity head with angled vacuum conduit system, apparatus and method | Michael Ravkin, John M. de Larios, Fred C. Redeker, Erik M. Freer | 2011-07-12 |
| 7939139 | Methods for atomic layer deposition (ALD) using a proximity meniscus | Mike Ravkin, Mark Wilcoxson | 2011-05-10 |
| 7897213 | Methods for contained chemical surface treatment | Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker, John M. de Larios, Erik M. Freer | 2011-03-01 |
| 7884017 | Thermal methods for cleaning post-CMP wafers | Zhonghui Wang, Tiruchirapalli Arunagiri, Fritz Redeker, Yezdi Dordi, John M. Boyd +3 more | 2011-02-08 |
| 7862662 | Method and material for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2011-01-04 |
| 7806126 | Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same | Katrina Mikhaylichenko, Kenneth C. Dodge, Michael Ravkin, John M. de Larios, Fritz Redeker | 2010-10-05 |
| 7799141 | Method and system for using a two-phases substrate cleaning compound | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker | 2010-09-21 |
| 7749689 | Methods for providing a confined liquid for immersion lithography | David Hemker, Fred C. Redeker, John M. Boyd, John M. de Larios, Michael Ravkin | 2010-07-06 |