Issued Patents All Time
Showing 51–67 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7737097 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2010-06-15 |
| 7709400 | Thermal methods for cleaning post-CMP wafers | Zhonghui Wang, Tiruchirapalli Arunagiri, Fritz Redeker, Yezdi Dordi, John M. Boyd +3 more | 2010-05-04 |
| 7696141 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2010-04-13 |
| 7648584 | Method and apparatus for removing contamination from substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker +2 more | 2010-01-19 |
| 7632376 | Method and apparatus for atomic layer deposition (ALD) in a proximity system | Mike Ravkin, Mark Wilcoxson | 2009-12-15 |
| 7615486 | Apparatus and method for integrated surface treatment and deposition for copper interconnect | Hyungsuk Alexander Yoon, Fritz Redeker, John M. Boyd, Yezdi Dordi | 2009-11-10 |
| 7614411 | Controls of ambient environment during wafer drying using proximity head | John M. de Larios, Mike Ravkin, Jeffrey Farber | 2009-11-10 |
| 7591613 | Method and apparatus for transporting a substrate using non-newtonian fluid | John M. de Larios, Mike Ravkin, John Parks, Fred C. Redeker | 2009-09-22 |
| 7581875 | Method and apparatus for thin metal film thickness measurement | Yehiel Gotkis | 2009-09-01 |
| 7568490 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Fritz Redeker, Aleksander Owczarz | 2009-08-04 |
| 7534307 | Methods for processing wafer surfaces using thin, high velocity fluid layer | Michael Ravkin, Michael G. R. Smith, John M. de Larios, Fritz Redeker, Christian DiPietro | 2009-05-19 |
| 7416370 | Method and apparatus for transporting a substrate using non-Newtonian fluid | John M. de Larios, Mike Ravkin, John Parks, Fred C. Redeker | 2008-08-26 |
| 7383843 | Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer | Michael Ravkin, Michael G. R. Smith, John M. de Larios, Fritz Redeker, Christian DiPietro | 2008-06-10 |
| 7367345 | Apparatus and method for providing a confined liquid for immersion lithography | David Hemker, Fred C. Redeker, John M. Boyd, John M. de Larios, Michael Ravkin | 2008-05-06 |
| 7204639 | Method and apparatus for thin metal film thickness measurement | Yehiel Gotkis | 2007-04-17 |
| 7078344 | Stress free etch processing in combination with a dynamic liquid meniscus | Andrew D. Bailey, III, Michael Ravkin, Puneet Yadav | 2006-07-18 |
| 6534381 | Method for fabricating multi-layered substrates | Nathan W. Cheung, William G. En, Sharon N. Farrens | 2003-03-18 |