Issued Patents All Time
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6531029 | Vacuum plasma processor apparatus and method | Kenji Takeshita, Tom Choi, Frank Y. Lin | 2003-03-11 |
| 6527911 | Configurable plasma volume etch chamber | Bi-Ming Yen, Lumin Li, David Hemker | 2003-03-04 |
| 6526355 | Integrated full wavelength spectrometer for wafer processing | Tuan Ngo, Chung-Ho Huang, Andrew Lui, Farro Kaveh | 2003-02-25 |
| 6514378 | Method for improving uniformity and reducing etch rate variation of etching polysilicon | Kenji Takeshita, Tom Choi, Frank Y. Lin, Wenli Collison | 2003-02-04 |
| 6503766 | Method and system for detecting an exposure of a material on a semiconductor wafer during chemical-mechanical polishing | — | 2003-01-07 |
| 6465159 | Method and apparatus for side wall passivation for organic etch | Nancy Tran | 2002-10-15 |
| 6461974 | High temperature tungsten etching process | Kenji Takeshita, Thomas S. Choi | 2002-10-08 |
| 6451158 | Apparatus for detecting the endpoint of a photoresist stripping process | Wenli Collison | 2002-09-17 |
| 6388383 | Method of an apparatus for obtaining neutral dissociated gas atoms | Wenli Collison | 2002-05-14 |
| 6257168 | Elevated stationary uniformity ring design | Wenli Collison | 2001-07-10 |
| 6230651 | Gas injection system for plasma processing | Alex Demos | 2001-05-15 |
| 6062729 | Rapid IR transmission thermometry for wafer temperature sensing | Michael Barnes | 2000-05-16 |
| 6052176 | Processing chamber with optical window cleaned using process gas | Wenli Collison | 2000-04-18 |