| 9761671 |
Engineered substrates for use in crystalline-nitride based devices |
Ajit Paranjpe, Joe H. Lamb |
2017-09-12 |
| 9356188 |
Tensile separation of a semiconducting stack |
Ajit Paranjpe, Jia-Sheng Lee |
2016-05-31 |
| 8951351 |
Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects |
Kailash Kiran Patalay, Jean R. Vatus |
2015-02-10 |
| 8852349 |
Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects |
Juan Chacin, Roger N. Anderson, Kailash Kiran Patalay |
2014-10-07 |
| 8726837 |
Semiconductor process chamber vision and monitoring system |
Kailash Kiran Patalay, David K. Carlson |
2014-05-20 |
| 8524555 |
Susceptor with backside area of constant emissivity |
Errol Antonio C. Sanchez, David K. Carlson |
2013-09-03 |
| 8519298 |
Split laser scribe |
Jianmin Wang, Gregory W. Schuh |
2013-08-27 |
| 8496780 |
Apparatus for the deposition of high dielectric constant films |
Bobby Ronsse, Richard O. Collins |
2013-07-30 |
| 8382180 |
Advanced FI blade for high temperature extraction |
Dinesh Kanawade, Chandrasekhar Balasubramanyam |
2013-02-26 |
| 8372203 |
Apparatus temperature control and pattern compensation |
Juan Chacin, Aaron Muir Hunter, Roger N. Anderson |
2013-02-12 |
| 8343279 |
Apparatuses for atomic layer deposition |
Nyi O. Myo, Kenric Choi, Shreyas Kher, Pravin K. Narwankar, Steve Poppe +1 more |
2013-01-01 |
| 8282992 |
Methods for atomic layer deposition of hafnium-containing high-K dielectric materials |
Nyi O. Myo, Kenric Cho, Shreyas Kher, Pravin K. Narwankar, Steve Poppe +1 more |
2012-10-09 |
| 8226770 |
Susceptor with backside area of constant emissivity |
Errol Antonio C. Sanchez, David K. Carlson |
2012-07-24 |
| 8071167 |
Surface pre-treatment for enhancement of nucleation of high dielectric constant materials |
Shreyas Kher, Shixue Han |
2011-12-06 |
| 7691204 |
Film formation apparatus and methods including temperature and emissivity/pattern compensation |
Juan Chacin, Aaron Muir Hunter, Roger N. Anderson |
2010-04-06 |
| 7674337 |
Gas manifolds for use during epitaxial film formation |
David Masayuki Ishikawa, Ali Zojaji, Yihwan Kim, Arkadii V. Samoilov |
2010-03-09 |
| 7569500 |
ALD metal oxide deposition process using direct oxidation |
Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya |
2009-08-04 |
| 7569501 |
ALD metal oxide deposition process using direct oxidation |
Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya |
2009-08-04 |
| 7547952 |
Method for hafnium nitride deposition |
Shreyas Kher, Yeong-kwan Kim, M. Noel Rocklein, Steven M. George |
2009-06-16 |
| 7531468 |
System and method for forming a gate dielectric |
Shreyas Kher, Shixue Han |
2009-05-12 |
| 7304004 |
System and method for forming a gate dielectric |
Shreyas Kher, Shixue Han |
2007-12-04 |
| 7067439 |
ALD metal oxide deposition process using direct oxidation |
Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya |
2006-06-27 |
| 6858547 |
System and method for forming a gate dielectric |
Shreyas Kher, Shixue Han |
2005-02-22 |
| 6454860 |
Deposition reactor having vaporizing, mixing and cleaning capabilities |
Turgut Sahin, Gregory Redinbo, Pravin K. Narwankar, Patricia M. Liu |
2002-09-24 |
