Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9761671 | Engineered substrates for use in crystalline-nitride based devices | Ajit Paranjpe, Joe H. Lamb | 2017-09-12 |
| 9356188 | Tensile separation of a semiconducting stack | Ajit Paranjpe, Jia-Sheng Lee | 2016-05-31 |
| 8951351 | Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects | Kailash Kiran Patalay, Jean R. Vatus | 2015-02-10 |
| 8852349 | Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects | Juan Chacin, Roger N. Anderson, Kailash Kiran Patalay | 2014-10-07 |
| 8726837 | Semiconductor process chamber vision and monitoring system | Kailash Kiran Patalay, David K. Carlson | 2014-05-20 |
| 8524555 | Susceptor with backside area of constant emissivity | Errol Antonio C. Sanchez, David K. Carlson | 2013-09-03 |
| 8519298 | Split laser scribe | Jianmin Wang, Gregory W. Schuh | 2013-08-27 |
| 8496780 | Apparatus for the deposition of high dielectric constant films | Bobby Ronsse, Richard O. Collins | 2013-07-30 |
| 8382180 | Advanced FI blade for high temperature extraction | Dinesh Kanawade, Chandrasekhar Balasubramanyam | 2013-02-26 |
| 8372203 | Apparatus temperature control and pattern compensation | Juan Chacin, Aaron Muir Hunter, Roger N. Anderson | 2013-02-12 |
| 8343279 | Apparatuses for atomic layer deposition | Nyi O. Myo, Kenric Choi, Shreyas Kher, Pravin K. Narwankar, Steve Poppe +1 more | 2013-01-01 |
| 8282992 | Methods for atomic layer deposition of hafnium-containing high-K dielectric materials | Nyi O. Myo, Kenric Cho, Shreyas Kher, Pravin K. Narwankar, Steve Poppe +1 more | 2012-10-09 |
| 8226770 | Susceptor with backside area of constant emissivity | Errol Antonio C. Sanchez, David K. Carlson | 2012-07-24 |
| 8071167 | Surface pre-treatment for enhancement of nucleation of high dielectric constant materials | Shreyas Kher, Shixue Han | 2011-12-06 |
| 7691204 | Film formation apparatus and methods including temperature and emissivity/pattern compensation | Juan Chacin, Aaron Muir Hunter, Roger N. Anderson | 2010-04-06 |
| 7674337 | Gas manifolds for use during epitaxial film formation | David Masayuki Ishikawa, Ali Zojaji, Yihwan Kim, Arkadii V. Samoilov | 2010-03-09 |
| 7569500 | ALD metal oxide deposition process using direct oxidation | Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya | 2009-08-04 |
| 7569501 | ALD metal oxide deposition process using direct oxidation | Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya | 2009-08-04 |
| 7547952 | Method for hafnium nitride deposition | Shreyas Kher, Yeong-kwan Kim, M. Noel Rocklein, Steven M. George | 2009-06-16 |
| 7531468 | System and method for forming a gate dielectric | Shreyas Kher, Shixue Han | 2009-05-12 |
| 7304004 | System and method for forming a gate dielectric | Shreyas Kher, Shixue Han | 2007-12-04 |
| 7067439 | ALD metal oxide deposition process using direct oxidation | Shreyas Kher, Vidyut Gopal, Shixue Han, Shankarram Athreya | 2006-06-27 |
| 6858547 | System and method for forming a gate dielectric | Shreyas Kher, Shixue Han | 2005-02-22 |
| 6454860 | Deposition reactor having vaporizing, mixing and cleaning capabilities | Turgut Sahin, Gregory Redinbo, Pravin K. Narwankar, Patricia M. Liu | 2002-09-24 |