Issued Patents All Time
Showing 25 most recent of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12142671 | Semiconductor device | Dong Chan Suh, Sangmoon Lee, Woo Bin Song, Dongsuk Shin, Seung-ryul Lee | 2024-11-12 |
| 11996443 | Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same | Sungkeun Lim, Unki Kim, Yuyeong Jo, Jinbum Kim, Pankwi Park +2 more | 2024-05-28 |
| 11322583 | Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same | Sungkeun Lim, Unki Kim, Yuyeong Jo, Jinbum Kim, Pankwi Park +2 more | 2022-05-03 |
| 11171224 | Semiconductor device | Dong Chan Suh, Sangmoon Lee, Woo Bin Song, Dongsuk Shin, Seung-ryul Lee | 2021-11-09 |
| 10731272 | Methods and apparatus for deposition processes | Nyi O. Myo, Kevin Joseph Bautista, Zhiyuan Ye, Schubert S. Chu | 2020-08-04 |
| 10692993 | Semiconductor device and method for manufacturing the same | Dong Chan Suh, Sangmoon Lee, Woo Bin Song, Dongsuk Shin, Seung-ryul Lee | 2020-06-23 |
| 10304834 | Semiconductor devices and method of fabricating the same | Sangmoon Lee, Jungtaek Kim, Woo Bin Song, Dongsuk Shin, Seung-ryul Lee | 2019-05-28 |
| 10260164 | Methods and apparatus for deposition processes | Nyi O. Myo, Kevin Joseph Bautista, Zhiyuan Ye, Schubert S. Chu | 2019-04-16 |
| 10208401 | Substrate treating apparatus | Keum Seok Park, Sunjung Kim | 2019-02-19 |
| 9805942 | Method of modifying epitaxial growth shape on source drain area of transistor | Xuebin Li, Abhishek Dube | 2017-10-31 |
| 9721792 | Method of forming strain-relaxed buffer layers | Yi-Chiau Huang | 2017-08-01 |
| 9704708 | Halogenated dopant precursors for epitaxy | Abhishek Dube, Xuebin Li | 2017-07-11 |
| 9673277 | Methods and apparatus for forming horizontal gate all around device structures | Adam Brand, Bingxi Wood, Naomi Yoshida, Lin Dong, Shiyu Sun +1 more | 2017-06-06 |
| 9650726 | Methods and apparatus for deposition processes | Nyi O. Myo, Kevin Joseph Bautista, Zhiyuan Ye, Schubert S. Chu | 2017-05-16 |
| 9530661 | Method of modifying epitaxial growth shape on source drain area of transistor | Xuebin Li, Abhishek Dube | 2016-12-27 |
| 9460918 | Epitaxy of high tensile silicon alloy for tensile strain applications | Zhiyuan Ye, Xuebin Li, Saurabh Chopra | 2016-10-04 |
| 9200367 | Method and apparatus for gas delivery | Zhiyuan Ye | 2015-12-01 |
| 9064960 | Selective epitaxy process control | Andrew Lam | 2015-06-23 |
| 9058988 | Methods for depositing layers having reduced interfacial contamination | Jean R. Vatus, Jinsong Tang, Satheesh Kuppurao, Errol Antonio C. Sanchez | 2015-06-16 |
| 9012328 | Carbon addition for low resistivity in situ doped silicon epitaxy | Zhiyuan Ye, Xuebin Li, Saurabh Chopra | 2015-04-21 |
| 8999821 | Fin formation by epitaxial deposition | Adam Brand, Bingxi Wood, Errol Antonio C. Sanchez, Yi-Chiau Huang, John Boland | 2015-04-07 |
| 8927066 | Method and apparatus for gas delivery | Zhiyuan Ye | 2015-01-06 |
| 8728944 | Method of removing contaminants and native oxides from a substrate surface | Satheesh Kuppurao, Manish Hemkar, Vinh N. TRAN | 2014-05-20 |
| 8652951 | Selective epitaxial germanium growth on silicon-trench fill and in situ doping | Yi-Chiau Huang, Jiping Li, Miao Jin, Bingxi Wood, Errol Antonio C. Sanchez | 2014-02-18 |
| 8652945 | Epitaxy of high tensile silicon alloy for tensile strain applications | Zhiyuan Ye, Xuebin Li, Saurabh Chopra | 2014-02-18 |