Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9064960 | Selective epitaxy process control | Yihwan Kim | 2015-06-23 |
| 8991332 | Apparatus to control semiconductor film deposition characteristics | Satheesh Kuppurao, David K. Carlson, Manish Hemkar, Errol Antonio C. Sanchez, Howard Beckford | 2015-03-31 |
| 7897495 | Formation of epitaxial layer containing silicon and carbon | Zhiyuan Ye, Yihwan Kim | 2011-03-01 |
| 7776698 | Selective formation of silicon carbon epitaxial layer | Zhiyuan Ye, Saurabh Chopra, Yihwan Kim | 2010-08-17 |
| 7772074 | Method of forming conformal silicon layer for recessed source-drain | Zhiyuan Ye, Saurabh Chopra, Yihwan Kim | 2010-08-10 |
| 7718225 | Method to control semiconductor film deposition characteristics | Satheesh Kuppurao, David K. Carlson, Manish Hemkar, Errol Antonio C. Sanchez, Howard Beckford | 2010-05-18 |
| 7588980 | Methods of controlling morphology during epitaxial layer formation | Yihwan Kim | 2009-09-15 |
| 7494545 | Epitaxial deposition process and apparatus | Yihwan Kim, Satheesh Kuppurao, See-Eng Phan, Xinliang Lu, Chien-Teh Kao | 2009-02-24 |
| 7488690 | Silicon nitride film with stress control | R. Suryanarayanan Iyer, Yuji Maeda, Thomas C. Mele, Jacob Smith, Sean M. Seutter +3 more | 2009-02-10 |