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Selective epitaxy process control |
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2015-06-23 |
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Apparatus to control semiconductor film deposition characteristics |
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2015-03-31 |
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Formation of epitaxial layer containing silicon and carbon |
Zhiyuan Ye, Yihwan Kim |
2011-03-01 |
| 7776698 |
Selective formation of silicon carbon epitaxial layer |
Zhiyuan Ye, Saurabh Chopra, Yihwan Kim |
2010-08-17 |
| 7772074 |
Method of forming conformal silicon layer for recessed source-drain |
Zhiyuan Ye, Saurabh Chopra, Yihwan Kim |
2010-08-10 |
| 7718225 |
Method to control semiconductor film deposition characteristics |
Satheesh Kuppurao, David K. Carlson, Manish Hemkar, Errol Antonio C. Sanchez, Howard Beckford |
2010-05-18 |
| 7588980 |
Methods of controlling morphology during epitaxial layer formation |
Yihwan Kim |
2009-09-15 |
| 7494545 |
Epitaxial deposition process and apparatus |
Yihwan Kim, Satheesh Kuppurao, See-Eng Phan, Xinliang Lu, Chien-Teh Kao |
2009-02-24 |
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Silicon nitride film with stress control |
R. Suryanarayanan Iyer, Yuji Maeda, Thomas C. Mele, Jacob Smith, Sean M. Seutter +3 more |
2009-02-10 |