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Apparatus to control semiconductor film deposition characteristics |
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Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems |
David K. Carlson, Satheesh Kuppurao, Herman Diniz, Kailash Kiran Patalay, Brian H. Burrows +4 more |
2014-03-04 |
| 7976634 |
Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems |
David K. Carlson, Satheesh Kuppurao, Herman Diniz, Kailash Kiran Patalay, Brian H. Burrows +4 more |
2011-07-12 |
| 7718225 |
Method to control semiconductor film deposition characteristics |
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2010-05-18 |
| 7709391 |
Methods for in-situ generation of reactive etch and growth specie in film formation processes |
Satheesh Kuppurao, David K. Carlson, Errol Antonio C. Sanchez |
2010-05-04 |
| 7560352 |
Selective deposition |
David K. Carlson, Satheesh Kuppurao, Errol Antonio C. Sanchez, Yihwan Kim |
2009-07-14 |
