WS

Wong-Cheng Shih

TSMC: 5 patents #4,208 of 12,232Top 35%
Applied Materials: 2 patents #3,641 of 7,310Top 50%
VS Vanguard International Semiconductor: 2 patents #238 of 585Top 45%
S( Semiconductor Manufacturing International (Shanghai): 1 patents #561 of 1,122Top 50%
Overall (All Time): #518,462 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
8269311 Multilayer oxide on nitride on oxide structure and method for the manufacture of semiconductor devices Chia-Ming Hsu 2012-09-18
6656844 Method of forming a protected crown capacitor structure utilizing the outside crown surface to increase capacitance Chun-Chieh Lin 2003-12-02
6640403 Method for forming a dielectric-constant-enchanced capacitor Lan-Lin Chao, Tai-Bor Wu, Chich-Shang Chang 2003-11-04
6620702 Method of producing low thermal budget high dielectric constant structures Lan-Lin Chao 2003-09-16
6559497 Microelectronic capacitor with barrier layer Tai-Bor Wu, Chich-Shang Chang 2003-05-06
6456482 Microelectronic capacitor with capacitor plate layer formed of tungsten rich tungsten oxide material Tai-Bor Wu, Chich-Shang Chang 2002-09-24
6436787 Method of forming crown-type MIM capacitor integrated with the CU damascene process Tzyh-Cheang Lee, Wenchi Ting, Chih-Hsien Lin, Shyh-Chyi Wong 2002-08-20
6387761 Anneal for enhancing the electrical characteristic of semiconductor devices Pravin K. Narwankar, Randall S. Urdahl, Turgut Sahin 2002-05-14
6103567 Method of fabricating dielectric layer Guan-Jye Peng, Lan-Lin Chao 2000-08-15
6037235 Hydrogen anneal for curing defects of silicon/nitride interfaces of semiconductor devices Pravin K. Narwankar, Randall S. Urdahl, Turgut Sahin 2000-03-14