Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5763536 | Polymer for positive acid catalyzed resists | James W. Thackeray, Mark D. Denison, Sheri L. Ablaza | 1998-06-09 |
| 5731364 | Photoimageable compositions comprising multiple arylsulfonium photoactive compounds | James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin | 1998-03-24 |
| 5731386 | Polymer for positive acid catalyzed resists | James W. Thackeray, Mark D. Denison, Sheri L. Ablaza | 1998-03-24 |
| 5719003 | Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers | Daniel Y. Pai, Timothy G. Adams | 1998-02-17 |
| 5700624 | Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups | James W. Thackeray, Mark D. Denison, Sheri L. Ablaza | 1997-12-23 |
| 5641604 | Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers | Daniel Y. Pai, Timothy G. Adams | 1997-06-24 |
| 5627010 | Photoimageable resist compositions containing photobase generator | Daniel Y. Pai, Stephen S. Rodriguez, Kevin J. Cheetham, Gary Stephen Calabrese | 1997-05-06 |
| 5541263 | Polymer having inert blocking groups | James W. Thackeray, George W. Orsula, Mark D. Denison, Sheri L. Ablaza | 1996-07-30 |
| 5514520 | Radiation sensitive composition comprising polymer having inert blocking groups | James W. Thackeray, George W. Orsula, Mark D. Denison, Sheri L. Ablaza | 1996-05-07 |
| 5384229 | Photoimageable compositions for electrodeposition | Daniel Y. Pai, Stephen S. Rodriguez | 1995-01-24 |
| 5362600 | Radiation sensitive compositions comprising polymer having acid labile groups | Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro | 1994-11-08 |
| 5344742 | Benzyl-substituted photoactive compounds and photoresist compositions comprising same | George G. Barclay, Martha M. Rajaratnam | 1994-09-06 |
| 5258257 | Radiation sensitive compositions comprising polymer having acid labile groups | Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro | 1993-11-02 |
| 5212046 | Near UV photoresist | Angelo A. Lamola, Gary Stephen Calabrese | 1993-05-18 |
| 5210000 | Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units | James W. Thackeray, George W. Orsula | 1993-05-11 |
| 5128232 | Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units | James W. Thackeray, George W. Orsula | 1992-07-07 |
| 4857227 | Liquid crystal mixtures having widened smectic temperature range | Timothy G. Adams | 1989-08-15 |
| 4843141 | Melt-processable aromatic polyesteramide having repeating 2,2'-substituted biphenylene radicals | Russell Gaudiana, Howard G. Rogers | 1989-06-27 |
| 4792597 | Melt-processable polyesteramides having para-linked, substituted-phenylene radicals | Russell Gaudiana, Howard G. Rogers | 1988-12-20 |
| 4608429 | Low-melting aromatic polyesters with repeating 2,2'-substituted-biphenylene radicals | Howard G. Rogers, Russell Gaudiana, Richard A. Minns | 1986-08-26 |
| 4575547 | Low-melting aromatic polyesters of trifluoromethyl terephthalic acid or ester forming derivatives thereof | Howard G. Rogers, Russell Gaudiana, Richard A. Minns | 1986-03-11 |