MD

Mark D. Denison

SL Shipley Company, L.L.C.: 9 patents #32 of 401Top 8%
📍 Cambridge, MA: #1,240 of 8,183 inventorsTop 20%
🗺 Massachusetts: #14,132 of 88,656 inventorsTop 20%
Overall (All Time): #589,452 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
6107425 Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists Roger F. Sinta, George G. Barclay, Jacque H. Georger, Jr., Sheri L. Ablaza 2000-08-22
5827634 Positive acid catalyzed resists James W. Thackeray, Roger F. Sinta, Sheri L. Ablaza 1998-10-27
5763536 Polymer for positive acid catalyzed resists James W. Thackeray, Roger F. Sinta, Sheri L. Ablaza 1998-06-09
5731386 Polymer for positive acid catalyzed resists James W. Thackeray, Roger F. Sinta, Sheri L. Ablaza 1998-03-24
5700624 Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups James W. Thackeray, Roger F. Sinta, Sheri L. Ablaza 1997-12-23
5541263 Polymer having inert blocking groups James W. Thackeray, George W. Orsula, Roger F. Sinta, Sheri L. Ablaza 1996-07-30
5514520 Radiation sensitive composition comprising polymer having inert blocking groups James W. Thackeray, George W. Orsula, Roger F. Sinta, Sheri L. Ablaza 1996-05-07
5368993 Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units James W. Thackeray, George W. Orsula 1994-11-29
5340696 Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent James W. Thackeray, George W. Orsula 1994-08-23