OO

Owendi Ongayi

RM Rohm And Haas Electronic Materials: 20 patents #22 of 562Top 4%
Dow Global Technologies: 6 patents #779 of 4,534Top 20%
📍 Marlborough, MA: #46 of 796 inventorsTop 6%
🗺 Massachusetts: #4,122 of 88,656 inventorsTop 5%
Overall (All Time): #160,145 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
12139595 Low coefficient of friction ethylene-based compositions Cosme Llop 2024-11-12
12098313 Low coefficient of friction laminates Cosme Llop, Marco Amici, Patrick Prele, Celine Chevallier 2024-09-24
11879056 Low coefficient of friction ethylene-based compositions Cosme Llop 2024-01-23
10754249 Coating compositions for photolithography Anthony Zampini, Michael K. Gallagher 2020-08-25
10481494 Coating compositions for use with an overcoated photoresist Vipul Jain, Suzanne M. Coley, Anthony Zampini 2019-11-19
10365562 Coating compositions for use with an overcoated photoresist Vipul Jain, Suzanne M. Coley, Anthony Zampini 2019-07-30
10114288 Silicon-containing underlayers Charlotte Cutler, Suzanne M. Coley, Christopher P. Sullivan, Paul J. LaBeaume, Li Cui +3 more 2018-10-30
10031420 Wet-strippable silicon-containing antireflectant Charlotte Cutler, Mingqi Li, Shintaro Yamada, James F. Cameron 2018-07-24
10007184 Silicon-containing underlayers Li Cui, Charlotte Cutler, Suzanne M. Coley, Christopher P. Sullivan, Paul J. LaBeaume +3 more 2018-06-26
9690199 Coating compositions for photolithography Anthony Zampini, Michael K. Gallagher 2017-06-27
9581901 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device Vipul Jain, James W. Thackeray, James F. Cameron 2017-02-28
9459533 Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist Matthew D. Christianson, Matthew M. Meyer 2016-10-04
9442377 Wet-strippable silicon-containing antireflectant Charlotte Cutler, Mingqi Li, Shintaro Yamada, James F. Cameron 2016-09-13
9323154 Coating compositions for photolithography Anthony Zampini, Michael K. Gallagher 2016-04-26
9244352 Coating compositions for use with an overcoated photoresist Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne M. Coley 2016-01-26
9229319 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device Vipul Jain, James W. Thackeray, James F. Cameron 2016-01-05
9206276 Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device James W. Thackeray, James F. Cameron 2015-12-08
9182669 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device Vipul Jain, James F. Cameron, James W. Thackeray, Suzanne M. Coley 2015-11-10
9182662 Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom James W. Thackeray 2015-11-10
8968981 Coating compositions for use with an overcoated photoresist Vipul Jain, Suzanne M. Coley, Anthony Zampini 2015-03-03
8932797 Photoacid generators James W. Thackeray, Suzanne M. Coley, James F. Cameron, Paul J. LaBeaume, Ahmad E. Madkour +1 more 2015-01-13
8900792 Polymerizable photoacid generators James W. Thackeray, Suzanne M. Coley, Vipul Jain, James F. Cameron, Paul J. LaBeaume +1 more 2014-12-02
8703383 Photosensitive copolymer and photoresist composition James W. Thackeray, Emad Aqad, Su Jin Kang 2014-04-22
8501383 Coating compositions for use with an overcoated photoresist Anthony Zampini, Vipul Jain, Cong Liu, Suzanne M. Coley 2013-08-06
8455178 Coating compositions for photolithography Anthony Zampini, Michael K. Gallagher, Vipul Jain 2013-06-04