Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12411409 | Aromatic underlayer | Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang +3 more | 2025-09-09 |
| 12287576 | Underlayer compositions and patterning methods | Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, James F. Cameron +2 more | 2025-04-29 |
| 12099300 | Aromatic underlayer | Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang +3 more | 2024-09-24 |
| 11940732 | Coating compositions and methods of forming electronic devices | Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang +3 more | 2024-03-26 |
| 11762294 | Coating composition for photoresist underlayer | Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, Iou-Sheng Ke | 2023-09-19 |
| 11733609 | Silicon-containing underlayers | Charlotte Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, James F. Cameron +1 more | 2023-08-22 |
| 11506979 | Method using silicon-containing underlayers | Li Cui, Paul J. LaBeaume, Charlotte Cutler, Shintaro Yamada, James F. Cameron +1 more | 2022-11-22 |
| 11360387 | Silicon-containing underlayers | Li Cui, Paul J. LaBeaume, James F. Cameron, Charlotte Cutler, Shintaro Yamada +1 more | 2022-06-14 |
| 11175581 | Aromatic resins for underlayers | Sheng Liu, Shintaro Yamada, James F. Cameron, Li Cui, Joshua Kaitz +1 more | 2021-11-16 |
| 10818493 | Silicon-based hardmask | Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere | 2020-10-27 |
| 10790146 | Aromatic resins for underlayers | Shintaro Yamada, Li Cui, Christopher Gilmore, Joshua Kaitz, Sheng Liu +1 more | 2020-09-29 |
| 10481494 | Coating compositions for use with an overcoated photoresist | Vipul Jain, Owendi Ongayi, Anthony Zampini | 2019-11-19 |
| 10365562 | Coating compositions for use with an overcoated photoresist | Owendi Ongayi, Vipul Jain, Anthony Zampini | 2019-07-30 |
| 10186424 | Silicon-based hardmask | Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere | 2019-01-22 |
| 10114288 | Silicon-containing underlayers | Charlotte Cutler, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Li Cui +3 more | 2018-10-30 |
| 10007184 | Silicon-containing underlayers | Li Cui, Charlotte Cutler, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume +3 more | 2018-06-26 |
| 9606434 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Amy M. Kwok +1 more | 2017-03-28 |
| 9557642 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Amy M. Kwok +1 more | 2017-01-31 |
| 9551930 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Amy M. Kwok +1 more | 2017-01-24 |
| 9527936 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Amy M. Kwok +1 more | 2016-12-27 |
| 9244352 | Coating compositions for use with an overcoated photoresist | Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Owendi Ongayi | 2016-01-26 |
| 9182669 | Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device | Owendi Ongayi, Vipul Jain, James F. Cameron, James W. Thackeray | 2015-11-10 |
| 8968981 | Coating compositions for use with an overcoated photoresist | Vipul Jain, Owendi Ongayi, Anthony Zampini | 2015-03-03 |
| 8932797 | Photoacid generators | James W. Thackeray, James F. Cameron, Paul J. LaBeaume, Ahmad E. Madkour, Owendi Ongayi +1 more | 2015-01-13 |
| 8927681 | Coating composition for use with an overcoated photoresist | Gerald B. Wayton, Peter Trefonas, III, Tomoki Kurihara | 2015-01-06 |