Issued Patents All Time
Showing 76–94 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5851738 | Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units | George W. Orsula | 1998-12-22 |
| 5827634 | Positive acid catalyzed resists | Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza | 1998-10-27 |
| 5763536 | Polymer for positive acid catalyzed resists | Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza | 1998-06-09 |
| 5731386 | Polymer for positive acid catalyzed resists | Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza | 1998-03-24 |
| 5700624 | Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups | Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza | 1997-12-23 |
| 5541263 | Polymer having inert blocking groups | George W. Orsula, Mark D. Denison, Roger F. Sinta, Sheri L. Ablaza | 1996-07-30 |
| 5514520 | Radiation sensitive composition comprising polymer having inert blocking groups | George W. Orsula, Mark D. Denison, Roger F. Sinta, Sheri L. Ablaza | 1996-05-07 |
| 5500127 | Purification process | Richard J. Carey | 1996-03-19 |
| 5368993 | Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units | Mark D. Denison, George W. Orsula | 1994-11-29 |
| 5362600 | Radiation sensitive compositions comprising polymer having acid labile groups | Roger F. Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, Dianne Canistro | 1994-11-08 |
| 5340696 | Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent | Mark D. Denison, George W. Orsula | 1994-08-23 |
| 5258257 | Radiation sensitive compositions comprising polymer having acid labile groups | Roger F. Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, Dianne Canistro | 1993-11-02 |
| 5210000 | Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units | George W. Orsula, Roger F. Sinta | 1993-05-11 |
| 5128232 | Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units | George W. Orsula, Roger F. Sinta | 1992-07-07 |
| 5108875 | Photoresist pattern fabrication employing chemically amplified metalized material | Stephen A. Fine | 1992-04-28 |
| 5079131 | Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations | Andrew W. McCullough | 1992-01-07 |
| 4921778 | Photoresist pattern fabrication employing chemically amplified metalized material | Stephen A. Fine | 1990-05-01 |
| 4533722 | Interfacial polycondensation polycarbonate process with quaternary phosphonium amino halide catalyst | John R. Campbell | 1985-08-06 |
| 4471105 | Interfacial polycondensation polycarbonate process with quaternary phosphonium amino halide catalyst | John R. Campbell | 1984-09-11 |