Issued Patents All Time
Showing 51–69 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9110369 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | Emad Aqad, Irvinder Kaur, Cong Liu, Mingqi Li, Gregory P. Prokopowicz | 2015-08-18 |
| 9067909 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | Irvinder Kaur, Emad Aqad, Cong Liu | 2015-06-30 |
| 9046767 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | Emad Aqad, Irvinder Kaur, Cong Liu, Mingqi Li | 2015-06-02 |
| 9029065 | Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article | Emad Aqad, Cong Liu, Mingqi Li, Shintaro Yamada | 2015-05-12 |
| 9012128 | Photoresist and coated substrate comprising same | Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, George G. Barclay | 2015-04-21 |
| 9005880 | Compositions comprising sulfonamide material and processes for photolithography | Deyan Wang, Chunyi Wu, George G. Barclay | 2015-04-14 |
| 8975006 | Compositions comprising carboxy component and processes for photolithography | Deyan Wang, Charles R. Szmanda, George G. Barclay | 2015-03-10 |
| 8956799 | Photoacid generator and photoresist comprising same | Emad Aqad, Mingqi Li, William Williams, III | 2015-02-17 |
| 8927190 | Photoresist comprising nitrogen-containing compound | Cong Liu, Chunyi Wu, Gerhard Pohlers, Gregory P. Prokopowicz | 2015-01-06 |
| 8900794 | Photoacid generator and photoresist comprising same | Emad Aqad, Mingqi Li, Shintaro Yamada, William Williams, III | 2014-12-02 |
| 8871428 | Compositions and processes for immersion lithography | Deyan Wang, George G. Barclay | 2014-10-28 |
| 8790861 | Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer | Cong Liu, Mingqi Li | 2014-07-29 |
| 8722825 | Surface active additive and photoresist composition comprising same | Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, George G. Barclay | 2014-05-13 |
| 8603728 | Polymer composition and photoresist comprising the polymer | Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu | 2013-12-10 |
| 8338077 | Photoacid generators and photoresists comprising same | Mingqi Li, Emad Aqad, Cong Liu | 2012-12-25 |
| 8257902 | Compositons and processes for immersion lithography | Deyan Wang, George G. Barclay | 2012-09-04 |
| 8158325 | Compositions and processes for photolithography | Deyan Wang | 2012-04-17 |
| 8012670 | Photoresist systems | Gary N. Taylor | 2011-09-06 |
| 7592125 | Photoresist compositions comprising resin blends | Yasuhiro Suzuki | 2009-09-22 |