Issued Patents All Time
Showing 26–50 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6576681 | Antireflective porogens | Michael K. Gallagher | 2003-06-10 |
| 6503689 | Antireflective composition | Manuel DoCanto, Robert Howard Gore | 2003-01-07 |
| 6492086 | Phenolic/alicyclic copolymers and photoresists | George G. Barclay, Ashish A. Pandya, Wang Yueh, Gary Ganghui Teng, Zhibiao Mao | 2002-12-10 |
| 6200479 | Phenolic resin purification | Harold F. Sandford | 2001-03-13 |
| 6051358 | Photoresist with novel photoactive compound | Harold F. Sandford | 2000-04-18 |
| 5945516 | Thermodynamically stable photoactive compound | Harold F. Sandford | 1999-08-31 |
| 5939511 | Resin purification process | Suzanne M. Coley | 1999-08-17 |
| 5932389 | Controlled alternating and block copolymer resins | — | 1999-08-03 |
| 5821345 | Thermodynamically stable photoactive compound | Harold F. Sandford | 1998-10-13 |
| 5789522 | Resin purification process | Suzanne M. Coley | 1998-08-04 |
| 5723254 | Photoresist with photoactive compound mixtures | Peter Trefonas, III, Pamela Turci, Catherine C. Meister, Gerald C. Vizvary | 1998-03-03 |
| 5679766 | Purification process of novolar resins using acid treated chelating cation exchange resin | — | 1997-10-21 |
| 5618932 | Photoactive compounds and compositions | Ashish A. Pandya | 1997-04-08 |
| 5589553 | Esterification product of aromatic novolak resin with quinone diazide sulfonyl group | Peter Trefonas, III | 1996-12-31 |
| 5571886 | Aromatic novolak resins | — | 1996-11-05 |
| 5529880 | Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound | Peter Trefonas, III | 1996-06-25 |
| 5514515 | Photoactive compounds having a heterocyclic group used in photoresist compositions | Ashish A. Pandya | 1996-05-07 |
| 5419995 | Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound | — | 1995-05-30 |
| 5266440 | Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons | — | 1993-11-30 |
| 5238776 | Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound | — | 1993-08-24 |
| 5216111 | Aromatic novolak resins and blends | — | 1993-06-01 |
| 5178986 | Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol | David C. Madoux, Peter Trefonas, III, Charles R. Szmanda | 1993-01-12 |
| 5164279 | Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol | Peter Trefonas, III, David C. Madoux | 1992-11-17 |
| 5130410 | Alternating and block copolymer resins | — | 1992-07-14 |
| 5128230 | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate | Michael K. Templeton, Peter Trefonas, III, James C. Woodbrey, David C. Madoux, Brian K. Daniels | 1992-07-07 |