Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7211365 | Negative photoresists for short wavelength imaging | Nicola Pugliano | 2007-05-01 |
| 7208261 | Polymers, processes for polymer synthesis and photoresist compositions | Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano | 2007-04-24 |
| 7189490 | Photoresists containing sulfonamide component | Subbareddy Kanagasabapathy | 2007-03-13 |
| 7118847 | Polymer and photoresist compositions | Charles R. Szmanda, Peter Trefonas, III, Wang Yueh | 2006-10-10 |
| 7105266 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | Wang Yueh | 2006-09-12 |
| 7090968 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | Zhibiao Mao, Robert J. Kavanagh | 2006-08-15 |
| 7022454 | Monomers, polymers, methods of synthesis thereof and photoresist compositions | Wang Yueh, Joseph Mattia | 2006-04-04 |
| 7022455 | Photoacid-labile polymers and photoresists comprising same | Patrick J. Bolton | 2006-04-04 |
| 7008750 | Processes for producing polysiloxanes and photoresist compositions comprising same | Subbareddy Kanagasabapathy, Matthew A. King | 2006-03-07 |
| 6855466 | Planarizing antireflective coating compositions | Edward K. Pavelchek, Timothy G. Adams, Manuel DoCanto, Suzanne M. Coley | 2005-02-15 |
| 6849376 | Polymers and photoresist compositions comprising same | Stefan J. Caporale | 2005-02-01 |
| 6849381 | Copolymers and photoresist compositions comprising same | Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia | 2005-02-01 |
| 6841331 | Polymers, processes for polymer synthesis and photoresist compositions | Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano | 2005-01-11 |
| 6803171 | Photoimageable composition | Dana Gronbeck, Leo L. Linehan, Kao Xiong, Subbareddy Kanagasabapathy | 2004-10-12 |
| 6777157 | Copolymers and photoresist compositions comprising same | Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia | 2004-08-17 |
| 6692888 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | Zhibiao Mao, Robert J. Kavanagh | 2004-02-17 |
| 6680159 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | Wang Yueh | 2004-01-20 |
| 6599677 | Polymer and photoresist compositions | Charles R. Szmanda, Peter Trefonas, III, Wang Yueh | 2003-07-29 |
| 6492086 | Phenolic/alicyclic copolymers and photoresists | Ashish A. Pandya, Wang Yueh, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao | 2002-12-10 |
| 6406828 | Polymer and photoresist compositions | Charles R. Szmanda, Peter Trefonas, III, Wang Yueh | 2002-06-18 |
| 6379861 | Polymers and photoresist compositions comprising same | Peter Trefonas, III, Gary N. Taylor | 2002-04-30 |
| 6316165 | Planarizing antireflective coating compositions | Edward K. Pavelchek, Timothy G. Adams, Manuel DoCanto, Suzanne M. Coley | 2001-11-13 |
| 6306554 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | Wang Yueh | 2001-10-23 |
| 6165674 | Polymers and photoresist compositions for short wavelength imaging | Gary N. Taylor, Charles R. Szmanda | 2000-12-26 |
| 6136501 | Polymers and photoresist compositions comprising same | Peter Trefonas, III, Gary N. Taylor | 2000-10-24 |