DW

Deyan Wang

RM Rohm And Haas Electronic Materials: 61 patents #3 of 562Top 1%
Dow Global Technologies: 4 patents #1,176 of 4,534Top 30%
RK Rohm And Haas Electronic Materials Korea: 3 patents #61 of 185Top 35%
DE Dupont Electronics: 1 patents #56 of 125Top 45%
SL Shipley Company, L.L.C.: 1 patents #226 of 401Top 60%
📍 Hudson, MA: #2 of 327 inventorsTop 1%
🗺 Massachusetts: #667 of 88,656 inventorsTop 1%
Overall (All Time): #33,673 of 4,157,543Top 1%
65
Patents All Time

Issued Patents All Time

Showing 51–65 of 65 patents

Patent #TitleCo-InventorsDate
8748080 Compositions and processes for photolithography Chunyi Wu 2014-06-10
8722825 Surface active additive and photoresist composition comprising same Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu, George G. Barclay 2014-05-13
8715902 Compositions and processes for immersion lithography 2014-05-06
8506788 Leveler compounds Robert D. Mikkola, George G. Barclay 2013-08-13
8262891 Leveler compounds Robert D. Mikkola, George G. Barclay 2012-09-11
8257902 Compositons and processes for immersion lithography Cheng-Bai Xu, George G. Barclay 2012-09-04
8241832 Compositions and processes for photolithography Chunyi Wu 2012-08-14
8158325 Compositions and processes for photolithography Cheng-Bai Xu 2012-04-17
8012666 Compositions and processes for photolithography Michael K. Gallagher 2011-09-06
7968268 Compositions and processes for immersion lithography 2011-06-28
7955778 Compositions and processes for photolithography Michael K. Gallagher 2011-06-07
7776506 Coating compositions for photoresists Peter Trefonas, III, Michael K. Gallagher 2010-08-17
7662981 Leveler compounds Robert D. Mikkola, Chunyi Wu, George G. Barclay 2010-02-16
7510639 Leveler compounds Robert D. Mikkola, Chunyi Wu, George G. Barclay 2009-03-31
7128822 Leveler compounds Chunyi Wu, Robert D. Mikkola 2006-10-31