Issued Patents All Time
Showing 26–50 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9507260 | Compositions and processes for photolithography | Chunyi Wu, Cheng-Bai Xu, George G. Barclay | 2016-11-29 |
| 9482945 | Photoresist compositions and methods of forming photolithographic patterns | Jong Keun Park, Christopher Nam Lee, Cecily Andes | 2016-11-01 |
| 9482948 | Photoresist compositions and methods of forming photolithographic patterns | Young Cheol Bae, Thomas Cardolaccia, Seokho KANG, Rosemary Bell | 2016-11-01 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Shintaro Yamada, Cong Liu, Mingqi Li, Joon Seok Oh, Chunyi Wu +2 more | 2016-09-06 |
| 9382444 | Neutral layer polymers, methods of manufacture thereof and articles comprising the same | Peter Trefonas, III, Phillip D. Hustad, Rahul Sharma, Mingqi Li, Jieqian Zhang | 2016-07-05 |
| 9296879 | Hardmask | Shintaro Yamada, Sabrina Wong, Cong Liu, Cheng-Bai Xu | 2016-03-29 |
| 9274427 | Compositions and processes for photolithography | Chunyi Wu | 2016-03-01 |
| 9244355 | Compositions and processes for immersion lithography | Stefan J. Caporale, George G. Barclay, Li Jia | 2016-01-26 |
| 9188864 | Photoresist compositions and methods of forming photolithographic patterns | Young Cheol Bae, Thomas Cardolaccia, Seokho KANG, Rosemary Bell | 2015-11-17 |
| 9171720 | Hardmask surface treatment | Peter Trefonas, III, Jieqian Zhang, Peng-Wei Chuang | 2015-10-27 |
| 9158198 | Photoresist compositions and methods of forming photolithographic patterns | Jong Keun Park, Christopher Nam Lee, Cecily Andes | 2015-10-13 |
| 9156785 | Base reactive photoacid generators and photoresists comprising same | Emad Aqad, Mingqi Li, Cheng-Bai Xu, Cong Liu, Joon Seok Oh +1 more | 2015-10-13 |
| 9136123 | Hardmask surface treatment | Peter Trefonas, III, Shintaro Yamada, Kathleen M. O'Connell | 2015-09-15 |
| 9122159 | Compositions and processes for photolithography | Chunyi Wu | 2015-09-01 |
| 9102901 | Methods and compositions for removal of metal hardmasks | Martin W. Bayes, Peter Trefonas, III, Kathleen M. O'Connell | 2015-08-11 |
| 9070548 | Metal hardmask compositions | Jibin Sun, Peter Trefonas, III, Kathleen M. O'Connell | 2015-06-30 |
| 9063425 | Topcoat compositions and photolithographic methods | — | 2015-06-23 |
| 9012128 | Photoresist and coated substrate comprising same | Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-Bai Xu, George G. Barclay | 2015-04-21 |
| 9005880 | Compositions comprising sulfonamide material and processes for photolithography | Chunyi Wu, George G. Barclay, Cheng-Bai Xu | 2015-04-14 |
| 8975006 | Compositions comprising carboxy component and processes for photolithography | Charles R. Szmanda, George G. Barclay, Cheng-Bai Xu | 2015-03-10 |
| 8927439 | Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent | Kathleen M. O'Connell, Peter Trefonas, III | 2015-01-06 |
| 8883400 | Compositions and processes for photolithography | Chunyi Wu | 2014-11-11 |
| 8871428 | Compositions and processes for immersion lithography | Cheng-Bai Xu, George G. Barclay | 2014-10-28 |
| 8808967 | Compositions and processes for photolithography | Chunyi Wu | 2014-08-19 |
| 8795774 | Hardmask | Jibin Sun, Peng-Wei Chuang, Peter Trefonas, III, Cong Liu | 2014-08-05 |