Issued Patents All Time
Showing 26–50 of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10042259 | Topcoat compositions and pattern-forming methods | Irvinder Kaur, Cong Liu, Doris Kang, Deyan Wang, Huaxing Zhou | 2018-08-07 |
| 10042255 | Block copolymers and pattern treatment compositions and methods | Huaxing Zhou, Vipul Jain, Jin Wuk Sung, Peter Trefonas, III, Phillip D. Hustad | 2018-08-07 |
| 10031420 | Wet-strippable silicon-containing antireflectant | Owendi Ongayi, Charlotte Cutler, Shintaro Yamada, James F. Cameron | 2018-07-24 |
| 10007184 | Silicon-containing underlayers | Li Cui, Charlotte Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan +3 more | 2018-06-26 |
| 10007179 | Thermal acid generators and photoresist pattern trimming compositions and methods | Irvinder Kaur, Cong Liu, Kevin Rowell, Gerhard Pohlers | 2018-06-26 |
| 9880469 | Resins for underlayers | Emad Aqad, Shintaro Yamada, Sung Wook Cho | 2018-01-30 |
| 9809672 | Aromatic resins for underlayers | Li Cui, Sung Wook Cho, Shintaro Yamada, Peter Trefonas, III, Robert L. Auger | 2017-11-07 |
| 9802400 | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers | Peter Trefonas, III, Deyan Wang, Rahul Sharma, Phillip D. Hustad | 2017-10-31 |
| 9735023 | Methods for manufacturing block copolymer compositions and articles manufactured therefrom | Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Jeffrey D. Weinhold | 2017-08-15 |
| 9720321 | Lactone photoacid generators and resins and photoresists comprising same | Emad Aqad, Cheng-Bai Xu, Cong Liu | 2017-08-01 |
| 9703203 | Compositions and methods for pattern treatment | Vipul Jain, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung | 2017-07-11 |
| 9684241 | Compositions and methods for pattern treatment | Vipul Jain, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung | 2017-06-20 |
| 9671697 | Pattern treatment methods | Huaxing Zhou, Vipul Jain, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung | 2017-06-06 |
| 9671689 | Cholate photoacid generators and photoresists comprising same | Emad Aqad, Joseph Mattia, Cheng-Bai Xu | 2017-06-06 |
| 9663682 | Methods for manufacturing block copolymers and articles manufactured therefrom | Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Jeffrey D. Weinhold | 2017-05-30 |
| 9665005 | Pattern treatment methods | Vipul Jain, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung | 2017-05-30 |
| 9601325 | Aromatic resins for underlayers | Emad Aqad, Shintaro Yamada, Sung Wook Cho | 2017-03-21 |
| 9558987 | Gap-fill methods | Jae Hwan Sim, Jin Hong Park, Jae-Bong Lim, Jung Kyu Jo, Cheng-Bai Xu +2 more | 2017-01-31 |
| 9540476 | Aromatic resins for underlayers | Li Cui, Sung Wook Cho, Shintaro Yamada, Peter Trefonas, III, Robert L. Auger | 2017-01-10 |
| 9511475 | Polishing device for removing polishing byproducts | Feng Chen | 2016-12-06 |
| 9507259 | Photoresist composition | Emad Aqad, Cong Liu, Ching-Lung Chen, Shintaro Yamada, Cheng-Bai Xu +1 more | 2016-11-29 |
| 9508549 | Methods of forming electronic devices including filling porous features with a polymer | Jong Keun Park, Phillip D. Hustad, Emad Aqad, Cheng-Bai Xu, Peter Trefonas, III +1 more | 2016-11-29 |
| 9442377 | Wet-strippable silicon-containing antireflectant | Owendi Ongayi, Charlotte Cutler, Shintaro Yamada, James F. Cameron | 2016-09-13 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Shintaro Yamada, Cong Liu, Joon Seok Oh, Chunyi Wu +2 more | 2016-09-06 |
| 9406527 | Semiconductor device manufacturing method and related semiconductor wafer | Jun Yang, Li Jiang, Pulei Zhu, Xiantao Li | 2016-08-02 |