Issued Patents All Time
Showing 26–50 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10886119 | Aromatic underlayer | Sheng Liu, Shintaro Yamada | 2021-01-05 |
| 10790146 | Aromatic resins for underlayers | Shintaro Yamada, Li Cui, Christopher Gilmore, Joshua Kaitz, Sheng Liu +1 more | 2020-09-29 |
| 10703917 | Coating compositions suitable for use with an overcoated photoresist | John P. Amara, Jin Wuk Sung, Gregory P. Prokopowicz | 2020-07-07 |
| 10539873 | Coating compositions suitable for use with an overcoated photoresist | Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri | 2020-01-21 |
| 10527935 | Radiation-sensitive compositions and patterning and metallization processes | Mitsuru Haga, Shugaku Kushida, Kunio Kainuma | 2020-01-07 |
| 10509315 | Photoacid generator | William Williams, III, Emad Aqad | 2019-12-17 |
| 10495968 | Iodine-containing polymers for chemically amplified resist compositions | Emad Aqad, James W. Thackeray | 2019-12-03 |
| 10317795 | Photoacid generator | William Williams, III, Emad Aqad | 2019-06-11 |
| 10248020 | Acid generators and photoresists comprising same | James W. Thackeray, Paul J. LaBeaume | 2019-04-02 |
| 10114288 | Silicon-containing underlayers | Charlotte Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume +3 more | 2018-10-30 |
| 10042251 | Zwitterionic photo-destroyable quenchers | Paul J. LaBeaume | 2018-08-07 |
| 10031420 | Wet-strippable silicon-containing antireflectant | Owendi Ongayi, Charlotte Cutler, Mingqi Li, Shintaro Yamada | 2018-07-24 |
| 10007184 | Silicon-containing underlayers | Li Cui, Charlotte Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan +3 more | 2018-06-26 |
| 9726977 | Coating compositions suitable for use with an overcoated photoresist | Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky +4 more | 2017-08-08 |
| 9708493 | Coating compositions suitable for use with an overcoated photoresist | John P. Amara, Jin Wuk Sung, Gregory P. Prokopowicz | 2017-07-18 |
| 9606434 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Paul J. LaBeaume, Vipul Jain, James W. Thackeray, Suzanne M. Coley, Amy M. Kwok +1 more | 2017-03-28 |
| 9581901 | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | Vipul Jain, Owendi Ongayi, James W. Thackeray | 2017-02-28 |
| 9557646 | Phenolic polymers and photoresists comprising same | — | 2017-01-31 |
| 9557642 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, Amy M. Kwok +1 more | 2017-01-31 |
| 9551930 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, Amy M. Kwok +1 more | 2017-01-24 |
| 9527936 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Vipul Jain, Paul J. LaBeaume, James W. Thackeray, Suzanne M. Coley, Amy M. Kwok +1 more | 2016-12-27 |
| 9499513 | Acid generators and photoresists comprising same | Vipul Jain, Paul J. LaBeaume, Jin Wuk Sung, James W. Thackeray | 2016-11-22 |
| 9442377 | Wet-strippable silicon-containing antireflectant | Owendi Ongayi, Charlotte Cutler, Mingqi Li, Shintaro Yamada | 2016-09-13 |
| 9229319 | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | Vipul Jain, Owendi Ongayi, James W. Thackeray | 2016-01-05 |
| 9206276 | Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device | Owendi Ongayi, James W. Thackeray | 2015-12-08 |