Issued Patents All Time
Showing 51–75 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7618764 | Positive resist compositions and patterning process | Shigeo Tanaka, Akihiro Seki, Tsunehiro Nishi | 2009-11-17 |
| 7550247 | Resist composition and patterning process | Mutsuo Nakashima, Yoshitaka Hamada, Kazumi Noda, Toshihiko Fujii | 2009-06-23 |
| 7510816 | Silicon-containing resist composition and patterning process | Kazumi Noda, Youichi Ohsawa | 2009-03-31 |
| 7494760 | Photoacid generators, chemically amplified resist compositions, and patterning process | Youichi Ohsawa, Akihiro Seki | 2009-02-24 |
| 7344827 | Fine contact hole forming method employing thermal flow process | Akihiro Seki, Eiji Fukuda | 2008-03-18 |
| 7276324 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Kazumi Noda, Katsuhiro Kobayashi | 2007-10-02 |
| 7261995 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | Takeru Watanabe, Koji Hasegawa, Kazumi Noda | 2007-08-28 |
| 7252925 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Akihiro Seki | 2007-08-07 |
| 6916591 | Photoacid generators, chemically amplified resist compositions, and patterning process | Youichi Ohsawa, Katsuhiro Kobayashi, Junji Tsuchiya, Kazunori Maeda | 2005-07-12 |
| 6737214 | Chemical amplification resist compositions | Takanobu Takeda, Osamu Watanabe, Kazuhiro Hirahara, Wataru Kusaki, Akihiro Seki | 2004-05-18 |
| 6635400 | Resist composition and patterning process | Hideto Kato, Kazuhiro Nishikawa, Yoshinori Hirano | 2003-10-21 |
| 6593056 | Chemically amplified positive resist composition and patterning method | Takanobu Takeda, Jun Watanabe, Kenji Koizumi | 2003-07-15 |
| 6511785 | Chemically amplified positive resist composition and patterning method | Kenji Koizumi, Tatsushi Kaneko, Toyohisa Sakurada | 2003-01-28 |
| 6395446 | Resist compositions and patterning process | Akihiro Seki, Youichi Ohsawa, Jun Watanabe, Shigehiro Nagura | 2002-05-28 |
| 6074804 | Pattern formation method | Masayuki Endo, Toshinobu Ishihara, Toru Kubota | 2000-06-13 |
| 6066433 | High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method | Junji Tsuchiya, Ichiro Kaneko, Toshinobu Ishihara | 2000-05-23 |
| 5972559 | Chemically amplified positive resist compositions | Satoshi Watanabe, Shigehiro Nagura | 1999-10-26 |
| 5882844 | Chemically amplified positive resist composition | Junji Tsuchiya, Toshinobu Ishihara, Shigehiro Nagura, Tsuguo Yamaoka | 1999-03-16 |
| 5880169 | Sulfonium salts and chemically amplified positive resist compositions | Yoichi Osawa, Satoshi Watanabe, Shigehiro Nagura, Akinobu Tanaka, Yoshio Kawai | 1999-03-09 |
| 5856561 | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | Takesi Nagata, Satoshi Watanabe, Tsunehiro Nishi, Shigehiro Nagura, Akinobu Tanaka +1 more | 1999-01-05 |
| 5847218 | Sulfonium salts and chemically amplified positive resist compositions | Youichi Ohsawa, Satoshi Watanabe, Junji Shimada, Shigehiro Nagura, Toshinobu Ishihara | 1998-12-08 |
| 5759739 | Resist composition with polymeric dissolution inhibitor and alkali soluble resin | Toshinobu Ishihara, Kazumasa Maruyama, Yoshihumi Takeda, Minoru Shigemitsu, Ken'ichi Itoh | 1998-06-02 |
| 5731126 | Chemically amplified positive resist compositions | Junji Tsuchiya, Toshinobu Ishihara | 1998-03-24 |
| 5728508 | Method of forming resist pattern utilizing fluorinated resin antireflective film layer | Toshinobu Ishihara, Satoshi Watanabe, Kazumasa Maruyama, Hirofumi Kishita, Kouichi Yamaguchi | 1998-03-17 |
| 5691396 | Polysiloxane compounds and positive resist compositions | Junji Tsuchiya, Osamu Watanabe, Toshinobu Ishihara | 1997-11-25 |