Issued Patents All Time
Showing 26–50 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9366961 | Silicone structure-bearing polymer, resin composition, and photo-curable dry film | Hiroyuki Urano, Takashi Miyazaki | 2016-06-14 |
| 9158191 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Takeru Watanabe, Takashi Miyazaki | 2015-10-13 |
| 9091919 | Silicone structure-bearing polymer, resin composition, and photo-curable dry film | Hiroyuki Urano, Takashi Miyazaki | 2015-07-28 |
| 9063421 | Chemically amplified positive resist composition and pattern forming process | Hiroyuki Yasuda, Shohei Tagami | 2015-06-23 |
| 9045587 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Takeru Watanabe, Tsutomu Ogihara | 2015-06-02 |
| 9017905 | Chemically amplified positive resist composition and pattern forming process | Masashi Iio, Takashi Miyazaki, Hideyoshi Yanagisawa | 2015-04-28 |
| 8980525 | Chemically amplified positive resist composition and patterning process | Hiroyuki Yasuda | 2015-03-17 |
| 8968979 | Positive resist composition and patterning process | Keiichi Masunaga, Daisuke Domon, Masayoshi Sagehashi | 2015-03-03 |
| 8968982 | Chemically amplified positive resist composition and patterning process | Hiroyuki Yasuda | 2015-03-03 |
| 8865391 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Takashi Miyazaki, Hiroyuki Urano | 2014-10-21 |
| 8846846 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Takeru Watanabe, Tsutomu Ogihara | 2014-09-30 |
| 8835697 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | Daisuke KORI, Takeshi Kinsho, Tsutomu Ogihara, Takeru Watanabe, Hiroyuki Urano | 2014-09-16 |
| 8835092 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | Takeru Watanabe, Takeshi Kinsho, Tsutomu Ogihara, Toshihiko Fujii, Daisuke KORI | 2014-09-16 |
| 8795955 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | Takeshi Kinsho, Daisuke KORI, Takeru Watanabe, Tsutomu Ogihara | 2014-08-05 |
| 8741548 | Patterning process | Jun Hatakeyama, Takao Yoshihara, Yoshio Kawai | 2014-06-03 |
| 8603732 | Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process | Tsutomu Ogihara, Takeru Watanabe, Takeshi Kinsho, Toshihiko Fujii, Daisuke KORI | 2013-12-10 |
| 8426110 | Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound | Takeru Watanabe, Tomohiro Kobayashi, Jun Hatakeyama | 2013-04-23 |
| 8247166 | Double patterning process | Tsunehiro Nishi, Jun Hatakeyama, Masaki Ohashi, Takeshi Kinsho | 2012-08-21 |
| 8153836 | Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing | Mutsuo Nakashima, Yoshitaka Hamada, Kazumi Noda | 2012-04-10 |
| 8129100 | Double patterning process | Jun Hatakeyama, Kazumi Noda, Mutsuo Nakashima, Masaki Ohashi, Toshinobu Ishihara | 2012-03-06 |
| 8129099 | Double patterning process | Jun Hatakeyama, Tsunehiro Nishi, Kazuhiro Katayama, Toshinobu Ishihara | 2012-03-06 |
| 7745094 | Resist composition and patterning process using the same | Mutsuo Nakashima, Yoshitaka Hamada, Kazumi Noda | 2010-06-29 |
| 7741015 | Patterning process and resist composition | Jun Hatakeyama, Takao Yoshihara, Takeshi Kinsho, Koji Hasegawa, Yoshio Kawai | 2010-06-22 |
| 7651829 | Positive resist material and pattern formation method using the same | Yoshitaka Hamada, Fujio Yagihashi, Mutsuo Nakashima, Kazumi Noda | 2010-01-26 |
| 7638260 | Positive resist compositions and patterning process | Akihiro Seki, Shigeo Tanaka, Tsunehiro Nishi | 2009-12-29 |