KN

Keisuke NIIDA

SC Shin-Etsu Chemical Co.: 16 patents #276 of 2,176Top 15%
IBM: 2 patents #32,839 of 70,183Top 50%
📍 Joetsu, JP: #61 of 239 inventorsTop 30%
Overall (All Time): #285,576 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
12332567 Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound Yusuke Kai, Tsutomu Ogihara 2025-06-17
12105420 Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer Daisuke KORI, Yasuyuki Yamamoto, Takayoshi NAKAHARA, Tsutomu Ogihara 2024-10-01
11886118 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film Daisuke KORI, Takashi SAWAMURA, Seiichiro Tachibana 2024-01-30
11851530 Material for forming organic film, patterning process, and polymer Daisuke KORI, Takashi SAWAMURA, Seiichiro Tachibana 2023-12-26
11692066 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film Daisuke KORI, Takashi SAWAMURA, Takeru Watanabe, Seiichiro Tachibana, Tsutomu Ogihara 2023-07-04
11676814 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Daisuke KORI, Takashi SAWAMURA, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara 2023-06-13
11635691 Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer Daisuke KORI, Takashi SAWAMURA, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara 2023-04-25
11500292 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film Daisuke KORI, Takashi SAWAMURA, Seiichiro Tachibana, Takeru Watanabe, Tsutomu Ogihara 2022-11-15
11307497 Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Seiichiro Tachibana, Takeru Watanabe, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara 2022-04-19
11181821 Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Takashi SAWAMURA 2021-11-23
11022882 Compound and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara +4 more 2021-06-01
10998197 Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Takashi SAWAMURA 2021-05-04
10934463 Adhesive film, method for forming an adhesive film, and urethane polymer Jun Hatakeyama, Motoaki Iwabuchi, Koji Hasegawa 2021-03-02
10864366 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode Jun Hatakeyama, Motoaki Iwabuchi, Osamu Watanabe 2020-12-15
10604618 Compound, method for manufacturing the compound, and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Hiroko Nagai, Takashi SAWAMURA, Tsutomu Ogihara +4 more 2020-03-31
10109485 Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process Tsutomu Ogihara, Yasuyuki Yamamoto 2018-10-23