HN

Hiroko Nagai

SC Shin-Etsu Chemical Co.: 7 patents #535 of 2,176Top 25%
IBM: 3 patents #26,272 of 70,183Top 40%
📍 Joetsu, JP: #102 of 239 inventorsTop 45%
Overall (All Time): #709,795 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
11307497 Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA, Tsutomu Ogihara 2022-04-19
11042090 Composition for forming organic film Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara 2021-06-22
11022882 Compound and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA, Tsutomu Ogihara +4 more 2021-06-01
10604618 Compound, method for manufacturing the compound, and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA, Tsutomu Ogihara +4 more 2020-03-31
10514605 Resist multilayer film-attached substrate and patterning process Seiichiro Tachibana, Tsutomu Ogihara, Romain Lallement, Karen E. Petrillo 2019-12-24
10416563 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Hironori Satoh, Takeru Watanabe, Daisuke KORI, Tsutomu Ogihara 2019-09-17
10241412 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Takeru Watanabe, Daisuke KORI, Tsutomu Ogihara 2019-03-26