Issued Patents All Time
Showing 51–75 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8450042 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2013-05-28 |
| 8323536 | Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film | Masaki Ohashi, Takeshi Kinsho, Kazumi Noda | 2012-12-04 |
| 8313890 | Antireflective coating composition, antireflective coating, and patterning process | Kazumi Noda, Takeru Watanabe, Jun Hatakeyama, Takeshi Kinsho | 2012-11-20 |
| 8288072 | Resist lower layer film-formed substrate | Jun Hatakeyama, Kazumi Noda, Takeshi Kinsho, Tsutomu Ogihara | 2012-10-16 |
| 8211618 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2012-07-03 |
| 8129086 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | Jun Hatakeyama, Takeru Watanabe | 2012-03-06 |
| 8105748 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho, Jun Hatakeyama | 2012-01-31 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Takeshi Kinsho, Youichi Ohsawa, Jun Hatakeyama | 2011-11-15 |
| 8048610 | Sulfonium salt-containing polymer, resist composition, and patterning process | Youichi Ohsawa, Jun Hatakeyama, Takeshi Kinsho | 2011-11-01 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Jun Hatakeyama, Youichi Ohsawa, Masaki Ohashi | 2011-10-18 |
| 7879530 | Antireflective coating composition, antireflective coating, and patterning process | Kazumi Noda, Jun Hatakeyama, Takeshi Kinsho | 2011-02-01 |
| 7871752 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho | 2011-01-18 |
| 7687222 | Polymerizable ester compounds, polymers, resist compositions and patterning process | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Masaki Ohashi | 2010-03-30 |
| 7687228 | Antireflection film composition and patterning process using the same | Jun Hatakeyama, Kazumi Noda, Takeshi Kinsho, Tsutomu Ogihara | 2010-03-30 |
| 7678530 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Satoshi Watanabe, Jun Hatakeyama, Takeshi Kinsho | 2010-03-16 |
| 7666571 | Polymer, resist composition and patterning process | Takeru Watanabe, Takao Yoshihara | 2010-02-23 |
| 7629106 | Resist composition and patterning process using the same | Jun Hatakeyama, Koji Hasegawa, Youichi Ohsawa | 2009-12-08 |
| 7618765 | Positive resist composition and patterning process | Tsunehiro Nishi, Katsuhiro Kobayashi | 2009-11-17 |
| 7601479 | Polymer, resist composition and patterning process | Tsunehiro Nishi, Tomohiro Kobayashi | 2009-10-13 |
| 7598015 | Polymer, resist composition and patterning process | Takeru Watanabe, Tsunehiro Nishi | 2009-10-06 |
| 7569326 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Youichi Ohsawa, Masaki Ohashi, Jun Hatakeyama, Takeru Watanabe | 2009-08-04 |
| 7541133 | Positive resist composition and patterning process | Tsunehiro Nishi, Katsuhiro Kobayashi | 2009-06-02 |
| 7531289 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Takeshi Kinsho, Takeru Watanabe, Masaki Ohashi, Koji Hasegawa | 2009-05-12 |